Controlled Morphologies of Nanostructured ZnO Films by MOCVD Method
2014 ◽
Vol 492
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pp. 311-315
Keyword(s):
Metal-organic chemical vapor deposition (MOCVD) method has been applied to grow nanostructured ZnO films on Si (100) substrate at temperatures ranging from 200 to 550 °C. The as-prepared films were characterized by XRD, SEM, XPS analysis. The growth rate of ZnO films increases with increasing the deposition temperatures. The deposition temperatures have a drastic effect on the crystallinity and morphology of the nanostructured ZnO. Whisker shaped ZnO is formed at a temperature of 350 °C. The deposition time also affects the morphology of the particles. At 400 °C, sample with one hour deposition forms whisker shaped ZnO nanostructures whereas that of with two hours deposition forms flower-like nanostructures.
2005 ◽
Vol 283
(1-2)
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pp. 87-92
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2014 ◽
Vol 2014
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pp. 1-7
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2010 ◽
Vol 10
(4)
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pp. 2741-2745
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2011 ◽
Vol 509
(5)
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pp. 1980-1983
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2009 ◽
Vol 255
(12)
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pp. 6201-6204
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