Effect of magnetic field strength on deposition rate and energy flux in a dc magnetron sputtering system

2009 ◽  
Vol 27 (6) ◽  
pp. 1275-1280 ◽  
Author(s):  
Samuel D. Ekpe ◽  
Francisco J. Jimenez ◽  
David J. Field ◽  
Martin J. Davis ◽  
Steven K. Dew
Keyword(s):  
Magnetic Field ◽  
Field Strength ◽  
Magnetron Sputtering ◽  
Magnetic Field Strength ◽  
Deposition Rate ◽  
Energy Flux ◽  
Dc Magnetron Sputtering ◽  
Sputtering System

Enhancements of Substrate Deposition Rate and Target Erosion Profile in a DC Magnetron Sputtering System

2009 ◽  
Vol 45 (10) ◽  
pp. 4391-4394 ◽  
Author(s):  
Cheng-Tsung Liu ◽  
Ming-Chih Lai ◽  
Chang-Chou Hwang ◽  
Chun-Hung Tu ◽  
Li-Yang Liu ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Rate ◽  
Dc Magnetron Sputtering ◽  
Sputtering System

Energy flux determines magnetic field strength of planets and stars

Nature ◽  
2009 ◽  
Vol 457 (7226) ◽  
pp. 167-169 ◽  
Author(s):  
Ulrich R. Christensen ◽  
Volkmar Holzwarth ◽  
Ansgar Reiners
Keyword(s):  
Magnetic Field ◽  
Field Strength ◽  
Magnetic Field Strength ◽  
Energy Flux

Tailoring the texture of titanium thin films deposited by high-power pulsed magnetron sputtering

2019 ◽  
Vol 33 (01n03) ◽  
pp. 1940017 ◽  
Author(s):  
D. L. Ma ◽  
Y. T. Li ◽  
Q. Y. Deng ◽  
B. Huang ◽  
Y. X. Leng ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Field Strength ◽  
Magnetron Sputtering ◽  
Magnetic Field Strength ◽  
High Power ◽  
Pulse Width ◽  
Substrate Bias ◽  
Out Of Plane ◽  
Pulsed Magnetron

Titanium (Ti) thin films with (002) or (100) texture are favored for many applications. In this paper, Ti thin films were prepared by high-power pulsed magnetron sputtering, and the texture of Ti thin films was successfully tailored by adjusting the pulse width, substrate bias and magnetic field strength. It is found that the peak power and average power of the Ti target are increased by increasing sputtering pulse width and decreasing magnetic field strength, which raise the Ti plasma flux and ion/atom ratio of Ti ions in front of the substrate simultaneously. Ti thin films with a highly (002) out-of-plane texture can be obtained with higher pulse width and lower magnetic field strength. The Ti thin films with highly (100) out-of-plane texture can be achieved with shorter pulse width, lower magnetic field strength and substrate bias.

On the Configuration of the Magnetic Field of β CrB

1976 ◽  
Vol 32 ◽  
pp. 613-622
Author(s):  
I.A. Aslanov ◽  
Yu.S. Rustamov
Keyword(s):  
Magnetic Field ◽  
Field Strength ◽  
Radial Velocity ◽  
Magnetic Field Strength ◽  
Complex Shape ◽  
Rotation Period ◽  
Field Variation ◽  
Magnetic Field Variation ◽  
Secular Variations ◽  
The Magnetic Field

SummaryMeasurements of the radial velocities and magnetic field strength of β CrB were carried out. It is shown that there is a variability with the rotation period different for various elements. The curve of the magnetic field variation measured from lines of 5 different elements: FeI, CrI, CrII, TiII, ScII and CaI has a complex shape specific for each element. This may be due to the presence of magnetic spots on the stellar surface. A comparison with the radial velocity curves suggests the presence of a least 4 spots of Ti and Cr coinciding with magnetic spots. A change of the magnetic field with optical depth is shown. The curve of the Heffvariation with the rotation period is given. A possibility of secular variations of the magnetic field is shown.

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