Monte Carlo simulations of secondary electron emission due to ion beam milling

AbstractThe secondary electron emission process is essential for the optimal operation of a wide range of applications, including fusion reactors, high-energy accelerators, or spacecraft. The process can be influenced and controlled by the use of a magnetic field. An analytical solution is proposed to describe the secondary electron emission process in an oblique magnetic field. It was derived from Monte Carlo simulations. The analytical formula captures the influence of the magnetic field magnitude and tilt, electron emission energy, electron reflection on the surface, and electric field intensity on the secondary emission process. The last two parameters increase the effective emission while the others act the opposite. The electric field effect is equivalent to a reduction of the magnetic field tilt. A very good agreement is shown between the analytical and numerical results for a wide range of parameters. The analytical solution is a convenient tool for the theoretical study and design of magnetically assisted applications, providing realistic input for subsequent simulations.

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Secondary electron emission and yield spectra of metals from Monte Carlo simulations and experiments

Journal of Physics Condensed Matter ◽

10.1088/1361-648x/aaf363 ◽

2018 ◽

Vol 31 (5) ◽

pp. 055901 ◽

Cited By ~ 1

Author(s):

Martina Azzolini ◽

Marco Angelucci ◽

Roberto Cimino ◽

Rosanna Larciprete ◽

Nicola M Pugno ◽

...

Keyword(s):

Monte Carlo ◽

Monte Carlo Simulations ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission

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Electron backscattering and secondary electron emission from carbon targets: comparison of experimental results with Monte Carlo simulations

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/26/12/026 ◽

1993 ◽

Vol 26 (12) ◽

pp. 2266-2271 ◽

Cited By ~ 17

Author(s):

H Farhang ◽

E Napchan ◽

B H Blott

Keyword(s):

Monte Carlo ◽

Monte Carlo Simulations ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Experimental Results ◽

Electron Backscattering

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Monte Carlo simulations of secondary electron emission from CsI, induced by 1–10 keV x rays and electrons

Journal of Applied Physics ◽

10.1063/1.351984 ◽

1992 ◽

Vol 72 (11) ◽

pp. 5429-5436 ◽

Cited By ~ 46

Author(s):

A. Akkerman ◽

A. Gibrekhterman ◽

A. Breskin ◽

R. Chechik

Keyword(s):

Monte Carlo ◽

Monte Carlo Simulations ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

X Rays

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SEM analysis of DC magnetron sputtered beryllium films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100106867 ◽

1988 ◽

Vol 46 ◽

pp. 960-961

Author(s):

E. F. Lindsey ◽

C. W. Price ◽

E. L. Pierce ◽

E. J. Hsieh

Keyword(s):

Fine Structure ◽

Electron Emission ◽

Secondary Electron ◽

Low Voltage ◽

Ion Beam ◽

Secondary Electron Emission ◽

Sem Analysis ◽

Fused Silica ◽

Grain Structure ◽

Silica Substrate

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

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