Plasma resistance of sintered and ion-plated yttrium oxyfluorides with various Y, O, and F composition ratios for use in plasma process chamber

2020 ◽  
Vol 38 (4) ◽  
pp. 043003
Author(s):  
Tetsuya Goto ◽  
Yoshinobu Shiba ◽  
Akinobu Teramoto ◽  
Yukio Kishi ◽  
Shigetoshi Sugawa
Author(s):  
H. Lorcet ◽  
M. Brothier ◽  
D. Guenadou ◽  
C. Latge ◽  
Armelle Vardelle
Keyword(s):  

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Hyeon-Myeong Oh ◽  
Young-Jo Park ◽  
Ha-Neul Kim ◽  
Kundan Kumar ◽  
Jae-Woong Ko ◽  
...  

AbstractMotivated by recent finding of crystallographic-orientation-dependent etching behavior of sintered ceramics, the plasma resistance of nanocrystalline Y2O3-MgO composite ceramics (YM) was evaluated for the first time. We report a remarkably high plasma etching resistance of nanostructure YM surpassing the plasma resistance of commercially used transparent Y2O3 and MgAl2O4 ceramics. The pore-free YM ceramic with grain sizes of several hundred nm was fabricated by hot press sintering, enabling theoretical maximum densification at low temperature. The insoluble two components effectively suppressed the grain growth by mutual pinning. The engineering implication of the developed YM nanocomposite imparts enhanced mechanical reliability, better cost effectiveness with excellent plasma resistance property over their counterparts in plasma using semiconductor applications.


Materials ◽  
2018 ◽  
Vol 11 (6) ◽  
pp. 891 ◽  
Author(s):  
Hyun-Jin Kim ◽  
Jun-Goo Shin ◽  
Choon-Sang Park ◽  
Dae Kum ◽  
Bhum Shin ◽  
...  

2021 ◽  
Vol 18 (7) ◽  
pp. 2170019
Author(s):  
Hang Chen ◽  
Angjian Wu ◽  
Stéphanie Mathieu ◽  
Peihan Gao ◽  
Xiaodong Li ◽  
...  
Keyword(s):  

2021 ◽  
Vol 18 (8) ◽  
pp. 2170022
Author(s):  
Yu Zhu ◽  
Zilan Xiong ◽  
Mengqi Li ◽  
Xingyu Chen ◽  
Chen Lu ◽  
...  
Keyword(s):  

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