In situ deposition of YBa2Cu3O7−x superconducting thin film without high pressure oxygen during film cooling*

1994 ◽  
Vol 12 (2) ◽  
pp. 533-535 ◽  
Author(s):  
Wendong Song ◽  
Daming Liu ◽  
Shuliang Jiao ◽  
Dongshen Lu ◽  
Chenwu An ◽  
...  
Author(s):  
Brian Drouin ◽  
Jiajun Hoo ◽  
V. Devi ◽  
D. Benner ◽  
David Robichaud ◽  
...  

2001 ◽  
Author(s):  
B. Vyskubenko ◽  
A. Adamenkov ◽  
S. Ilyin ◽  
Yu. Kolobyanin ◽  
I. Krukovsky ◽  
...  

2010 ◽  
Vol 447-448 ◽  
pp. 61-65 ◽  
Author(s):  
Kei Kitamura ◽  
Toshiro K. Doi ◽  
Syuhei Kurokawa ◽  
Yoji Umezaki ◽  
Yoji Matsukawa ◽  
...  

We designed and manufactured a prototype of a unique CMP machine, which can perform double-side CMP simultaneously in a sealed and pressure container as regarding effective action of the processing atmosphere around workpieces as important. Polishing experiments with single crystal silicon (Si) wafers (100) are performed by charging the container with various gases. As a result, the removal rates increased by up to 25% under high pressure oxygen gas atmosphere.


1992 ◽  
Vol 89 (2) ◽  
pp. 221-228 ◽  
Author(s):  
Theodore A. Steinberg ◽  
George P. Mulholland ◽  
D.Bruce Wilson ◽  
Frank J. Benz

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