Characterization of fluorinated tetra ethyl ortho silicate oxide films deposited in a low pressure plasma enhanced chemical vapor deposition reactor

1997 ◽  
Vol 15 (3) ◽  
pp. 1399-1402 ◽  
Author(s):  
M. T. Weise ◽  
S. C. Selbrede ◽  
L. J. Arias ◽  
D. Carl
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposition Reactor ◽  
Pressure Plasma ◽  
Low Pressure Plasma ◽  
Tetra Ethyl Ortho Silicate

High rate low pressure plasma-enhanced chemical vapor deposition for barrier and optical coatings

2013 ◽  
Vol 532 ◽  
pp. 44-49 ◽  
Author(s):  
Steffen Günther ◽  
Matthias Fahland ◽  
John Fahlteich ◽  
Björn Meyer ◽  
Steffen Straach ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
High Rate ◽  
Optical Coatings ◽  
Pressure Plasma ◽  
Low Pressure Plasma

scholarly journals PREPARATION OF CUBIC C3N4 THIN FILMS BY LOW-PRESSURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

1998 ◽  
Vol 47 (6) ◽  
pp. 1047
Author(s):  
ZHANG ZHI-HONG ◽  
GUO HUAI-XI ◽  
YU FEI-WEI ◽  
XIONG QI-HUA ◽  
YE MING-SHENG ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Plasma ◽  
Low Pressure Plasma
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