Reactive ion etching of via holes for GaAs high electron mobility transistors and monolithic microwave integrated circuits using Cl2/BCl3/Ar gas mixtures
1993 ◽
Vol 11
(5)
◽
pp. 1879
◽
1993 ◽
Vol 11
(6)
◽
pp. 2244
◽
1985 ◽
Vol 6
(2)
◽
pp. 81-82
◽
2006 ◽
Vol 45
(4B)
◽
pp. 3376-3379
◽
2011 ◽
Vol 1
(1)
◽
pp. 25-32
◽
2001 ◽
Vol 41
(8)
◽
pp. 1109-1113
◽
1983 ◽
Vol 30
(11)
◽
pp. 1569-1569
◽