Relationships between the material properties of silicon oxide films deposited by electron cyclotron resonance chemical vapor deposition and their use as an indicator of the dielectric constant
1994 ◽
Vol 12
(1)
◽
pp. 441
◽
2002 ◽
Vol 235
(1-4)
◽
pp. 333-339
◽
1996 ◽
Vol 14
(3)
◽
pp. 1687
◽
1995 ◽
Vol 05
(C5)
◽
pp. C5-671-C5-677