Low-Temperature Deposition of Hydrogenated Amorphous Silicon in an Electron Cyclotron Resonance Reactor for Flexible Displays

Electron Cyclotron ◽

Flexible Displays ◽

Temperature Deposition ◽

Hydrogenated Amorphous

Low-temperature deposition of high-quality silicon dioxide films by sputtering-type electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580664 ◽

1997 ◽

Vol 15 (4) ◽

pp. 1951-1954 ◽

Cited By ~ 20

Author(s):

H. Nakashima ◽

K. Furukawa ◽

Y. C. Liu ◽

D. W. Gao ◽

Y. Kashiwazaki ◽

...

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Deposition ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Low temperature deposition of SiN[sub x]:H using SiH[sub 4]–N[sub 2] or SiH[sub 4]–NH[sub 3] distributed electron cyclotron resonance microwave plasma

10.1116/1.589579 ◽

1997 ◽

Vol 15 (6) ◽

pp. 1919 ◽

Cited By ~ 12

Author(s):

F. Delmotte

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Temperature Deposition ◽

Resonance Microwave

Effect of Microwave Pulse on the Deposition Rate of Hydrogenated Amorphous Silicon in the Electron Cyclotron Resonance Plasma Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.l1191 ◽

1995 ◽

Vol 34 (Part 2, No. 9B) ◽

pp. L1191-L1193 ◽

Cited By ~ 5

Author(s):

Ju-Hyeon Lee ◽

Sang Kook Park ◽

Chang Sik Kim

Keyword(s):

Amorphous Silicon ◽

Deposition Rate ◽

Cyclotron Resonance ◽

Microwave Pulse ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Preparation of doped hydrogenated amorphous silicon films by microwave electron‐cyclotron‐resonance plasma discharge deposition

Journal of Applied Physics ◽

10.1063/1.338013 ◽

1987 ◽

Vol 61 (5) ◽

pp. 2084-2087 ◽

Cited By ~ 8

Author(s):

M. Kitagawa ◽

K. Setsune ◽

Y. Manabe ◽

T. Hirao

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous ◽

Low Temperature Preparation of Hydrogenated Amorphous Silicon by Microwave Electron-Cyclotron-Resonance Plasma CVD

Japanese Journal of Applied Physics ◽

10.1143/jjap.26.l231 ◽

1987 ◽

Vol 26 (Part 2, No. 4) ◽

pp. L231-L233 ◽

Cited By ~ 22

Author(s):

Masatoshi Kitagawa ◽

Shin-ichiro Ishihara ◽

Kentaro Setsune ◽

Yoshio Manabe ◽

Takashi Hirao

Keyword(s):

Low Temperature ◽

Amorphous Silicon ◽

Cyclotron Resonance ◽

Plasma Cvd ◽

Low Temperature Preparation ◽

Hydrogenated Amorphous ◽

Resonance Plasma ◽

Temperature Preparation

Low-Temperature Deposition of SrTiO3Thin Films by Electron-Cyclotron-Resonance Sputtering for Monolithic Microwave Integrated Circuits Operating in the mm-Wave Band

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.1960 ◽

1998 ◽

Vol 37 (Part 1, No. 4A) ◽

pp. 1960-1963 ◽

Cited By ~ 4

Author(s):

Kenji Ikuta ◽

Mitsuo Tsukada ◽

Hiroshi Nishimura

Keyword(s):

Low Temperature ◽

Integrated Circuits ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Wave Band ◽

Microwave Integrated Circuits ◽

Monolithic Microwave Integrated Circuits ◽

Temperature Deposition

Growth of Hydrogenated Amorphous Silicon in Electron Cyclotron Resonance Plasma

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.44-46.135 ◽

1995 ◽

Vol 44-46 ◽

pp. 135-180 ◽

Cited By ~ 5

Author(s):

M. Zhang ◽

Yukihiro Nakayama

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous ◽

RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enchanced chemical vapor deposition

10.1117/12.304500 ◽

1998 ◽

Author(s):

Yoshiyuki Hirano ◽

Fumio Sato ◽

Ahalapitiya H. Jayatissa ◽

Hiroshi Ohtake ◽

Kuniharu Takizawa

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance

Thin Solid Films ◽

10.1016/j.tsf.2006.11.105 ◽

2007 ◽

Vol 515 (19) ◽

pp. 7650-7653 ◽

Cited By ~ 4

Author(s):

T.H. Dao ◽

M.E. Gueunier-Farret ◽

D. Daineka ◽

P. Bulkin ◽

P. Roca i Cabarrocas ◽

...

Keyword(s):

Thin Films ◽

Amorphous Silicon ◽

Electronic Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Thermal Coupling ◽

Silicon Thin Films ◽

Hydrogenated Amorphous

Low-temperature deposition of hydrogenated amorphous silicon (a-Si:H): Control of polyhydride incorporation and its effects on thin film properties

Solar Cells ◽

10.1016/0379-6787(89)90022-7 ◽

1989 ◽

Vol 27 (1-4) ◽

pp. 121-136 ◽

Cited By ~ 11

Author(s):

G. Lucovsky ◽

G.N. Parsons ◽

C. Wang ◽

B.N. Davidson ◽

D.V. Tsu

Keyword(s):

Thin Film ◽

Low Temperature ◽

Amorphous Silicon ◽

Film Properties ◽

Temperature Deposition ◽

Hydrogenated Amorphous