New approach to low temperature deposition of high-quality thin films by electron cyclotron resonance microwave plasmas
1992 ◽
Vol 10
(5)
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pp. 2170
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1997 ◽
Vol 15
(4)
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pp. 1951-1954
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1997 ◽
Vol 15
(6)
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pp. 1919
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2003 ◽
Vol 27
(4)
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pp. 363-366
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2002 ◽
1997 ◽
Vol 121-122
◽
pp. 228-232
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2005 ◽
Vol 93
(7)
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pp. 1364-1373
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