Low-Temperature Deposition of SrTiO3Thin Films by Electron-Cyclotron-Resonance Sputtering for Monolithic Microwave Integrated Circuits Operating in the mm-Wave Band

Electron Cyclotron ◽

Wave Band ◽

Microwave Integrated Circuits ◽

Monolithic Microwave Integrated Circuits ◽

Temperature Deposition

Low-temperature deposition of high-quality silicon dioxide films by sputtering-type electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580664 ◽

1997 ◽

Vol 15 (4) ◽

pp. 1951-1954 ◽

Cited By ~ 20

Author(s):

H. Nakashima ◽

K. Furukawa ◽

Y. C. Liu ◽

D. W. Gao ◽

Y. Kashiwazaki ◽

...

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

High Quality ◽

Temperature Deposition ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Low temperature deposition of SiN[sub x]:H using SiH[sub 4]–N[sub 2] or SiH[sub 4]–NH[sub 3] distributed electron cyclotron resonance microwave plasma

10.1116/1.589579 ◽

1997 ◽

Vol 15 (6) ◽

pp. 1919 ◽

Cited By ~ 12

Author(s):

F. Delmotte

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Temperature Deposition ◽

Resonance Microwave

Electron cyclotron resonance etching of GaAs vias for monolithic microwave integrated circuits

Optical Materials ◽

10.1016/s0925-3467(99)00141-x ◽

2000 ◽

Vol 14 (3) ◽

pp. 223-227 ◽

Cited By ~ 3

Author(s):

Y.W Chen ◽

B.S Ooi ◽

G.I Ng

Keyword(s):

Integrated Circuits ◽

Cyclotron Resonance ◽

Monolithic Microwave Integrated Circuits

Electron Cyclotron ◽

Microwave Integrated Circuits ◽

Low-Temperature Deposition of Hydrogenated Amorphous Silicon in an Electron Cyclotron Resonance Reactor for Flexible Displays

Proceedings of the IEEE ◽

10.1109/jproc.2005.851533 ◽

2005 ◽

Vol 93 (7) ◽

pp. 1364-1373 ◽

Cited By ~ 11

Author(s):

A.J. Flewitt ◽

W.I. Milne

Keyword(s):

Low Temperature ◽

Amorphous Silicon ◽

Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Electron Cyclotron ◽

Flexible Displays ◽

Temperature Deposition ◽

Hydrogenated Amorphous

ChemInform Abstract: Low Temperature Deposition of TiN Using Tetrakis(dimethylamido)- Titanium in an Electron Cyclotron Resonance Plasma Process.

ChemInform ◽

10.1002/chin.199425027 ◽

2010 ◽

Vol 25 (25) ◽

pp. no-no

Author(s):

A. WEBER ◽

R. NIKULSKI ◽

C.-P. KLAGES ◽

M. E. GROSS ◽

W. L. BROWN ◽

...

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Process ◽

Temperature Deposition ◽

Low Temperature Deposition of TiN Using Tetrakis(dimethylamido)‐Titanium in an Electron Cyclotron Resonance Plasma Process

Journal of The Electrochemical Society ◽

10.1149/1.2054820 ◽

1994 ◽

Vol 141 (3) ◽

pp. 849-853 ◽

Cited By ~ 21

Author(s):

A. Weber ◽

R. Nikulski ◽

C. ‐P. Klages ◽

M. E. Gross ◽

W. L. Brown ◽

...

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Process ◽

Temperature Deposition ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

New approach to low temperature deposition of high-quality thin films by electron cyclotron resonance microwave plasmas

10.1116/1.586185 ◽

1992 ◽

Vol 10 (5) ◽

pp. 2170 ◽

Cited By ~ 7

Author(s):

T. T. Chau

Keyword(s):

Thin Films ◽

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Microwave Plasmas ◽

High Quality ◽

New Approach ◽

Temperature Deposition ◽

Resonance Microwave

Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069437 ◽

1992 ◽

Vol 139 (5) ◽

pp. 1489-1495 ◽

Cited By ~ 29

Author(s):

F. Plais ◽

B. Agius ◽

F. Abel ◽

J. Siejka ◽

M. Puech ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Temperature Deposition ◽

ChemInform Abstract: Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199230253 ◽

2010 ◽

Vol 23 (30) ◽

pp. no-no

Author(s):

F. PLAIS ◽

B. AGIUS ◽

F. ABEL ◽

J. SIEJKA ◽

M. PUECH ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Temperature Deposition ◽

Effect of Ion Mass and Ion Energy on Low-Temperature Deposition of Polycrystalline-Si Thin Film on SiO2Layer by Using Sputtering-Type Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.l511 ◽

2003 ◽

Vol 42 (Part 2, No. 5B) ◽

pp. L511-L513 ◽

Cited By ~ 4

Author(s):

Junli Wang ◽

Taishi Saitou ◽

Youhei Sugimoto ◽

Dong Wang ◽

Liwei Zhao ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Energy ◽

Temperature Deposition ◽

Resonance Plasma ◽

Si Thin Film