Surface roughness of SiO[sub 2] from a remote microwave plasma enhanced chemical vapor deposition process
1998 ◽
Vol 16
(4)
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pp. 2165
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2003 ◽
Vol 82
(3)
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pp. 571-574
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2012 ◽
Vol 12
(1)
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pp. 642-647
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2019 ◽
Vol 68
(12)
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pp. 1580-1585
1988 ◽
Vol 9
(3)
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pp. 237-249
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1993 ◽
Vol 140
(12)
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pp. 3588-3590
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2011 ◽
Vol 115
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pp. 10290-10298
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