Coherent object dimension measurement method with the outline images registration on a photodiode array

1993 ◽  
Author(s):  
Victor N. Michailov ◽  
I. V. Plechanova ◽  
L. V. Finogenov
2017 ◽  
Vol 46 (9) ◽  
pp. 912002
Author(s):  
李建 LI Jian ◽  
曹益平 CAO Yi-ping ◽  
陈澄 CHEN Cheng ◽  
万莹莹 WAN Ying-ying ◽  
付光凯 FU Guang-kai ◽  
...  

1996 ◽  
Vol 67 (10) ◽  
pp. 878-881
Author(s):  
Keigo KUCHIDA ◽  
Shino HAMAYA ◽  
Yusuke SAITO ◽  
Mitsuyoshi SUZUKI ◽  
Shunzo MIYOSHI

Author(s):  
Fandy Surya Pratama ◽  
Istianah Muslim ◽  
Muhammad Ihsan Zul

Head Anthropometry is a part of anthropometry that needed to be measured carefully. It is because human head becomes an important part that necessary to be protected. The protection aims to look after the safety of the human head. Safety factors can be achieved by designing head products. Therefore, head anthropometry data is required to make a product design Currently, data retrieval of head anthropometry is still using several measuring devices such as anthropometers, sliding callipers, spreading callipers, and tape gauges. This measurement method makes the standard deviation become higher and also take a lot of time to capture huge amounts of anthropometry data. However, the problem has been resolved by other study research with building a head dimension measurement system using digital camera. But the system still need the integration with digital camera. This study uses the IP Camera that has been integrated with the system to capture human head from the front and side. The captured image is segmented into several areas based on head dimension. Then, the image is processed using pixel measurement method by performing feature extraction on each head dimension to get the result of head dimension measurement. The result shows that calliper measurement and system measurement against ten of fourteen human head anthropometry dimensions is identical with the best distance between IP Camera and the head as far as 200 cm. This head anthropometry data is expected to make a contribution to Indonesian Ergonomics Society.


2010 ◽  
Vol 29 (12) ◽  
pp. 3375-3377
Author(s):  
Wu-jie ZHANG ◽  
Di LI ◽  
Feng YE

Author(s):  
J. B. Warren

Electron diffraction intensity profiles have been used extensively in studies of polycrystalline and amorphous thin films. In previous work, diffraction intensity profiles were quantitized either by mechanically scanning the photographic emulsion with a densitometer or by using deflection coils to scan the diffraction pattern over a stationary detector. Such methods tend to be slow, and the intensities must still be converted from analog to digital form for quantitative analysis. The Instrumentation Division at Brookhaven has designed and constructed a electron diffractometer, based on a silicon photodiode array, that overcomes these disadvantages. The instrument is compact (Fig. 1), can be used with any unmodified electron microscope, and acquires the data in a form immediately accessible by microcomputer.Major components include a RETICON 1024 element photodiode array for the de tector, an Analog Devices MAS-1202 analog digital converter and a Digital Equipment LSI 11/2 microcomputer. The photodiode array cannot detect high energy electrons without damage so an f/1.4 lens is used to focus the phosphor screen image of the diffraction pattern on to the photodiode array.


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