Effective aluminum oxide thin films deposition using reactive pulsed magnetron sputtering: possibilities and limitations
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2006 ◽
Vol 201
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pp. 1109-1116
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2012 ◽
Vol 30
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pp. 323-328
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2005 ◽
Vol 198
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pp. 152-155
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pp. 175216
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pp. 1502-1509
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2018 ◽
Vol 5
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pp. 15228-15232
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2010 ◽
Vol 504
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pp. S418-S421
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2017 ◽
Vol 4
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pp. 8638-8644
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2003 ◽
Vol 171
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pp. 29-33
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