Metalorganic chemical vapor deposition (MOCVD) and atomic force microscopy (AFM) study of high-quality Bi-2223 superconducting thin films
2006 ◽
Vol 200
(10)
◽
pp. 3224-3229
◽
1998 ◽
Vol 15
(10)
◽
pp. 724-726
◽
1992 ◽
Vol 31
(Part 2, No. 7A)
◽
pp. L864-L866
◽
1994 ◽
Vol 33
(Part 1, No. 1B)
◽
pp. 721-726
◽
1990 ◽
pp. 217-222
1991 ◽
Vol 9
(3)
◽
pp. 401-404
◽
1991 ◽
Vol 107
(1-4)
◽
pp. 699-704
◽
1993 ◽
Vol 3
(1)
◽
pp. 1-7
◽