Far-field beam-pattern of a twin-slot HEB mixer at 600GHz

2014 ◽  
Author(s):  
Kangmin Zhou ◽  
Yan Delorme ◽  
Roland Lefevre ◽  
Frederic Dauplay ◽  
Alexandre Feret ◽  
...  
Keyword(s):  
Beam Pattern ◽  
Far Field

scholarly journals Method to Determine the Far-Field Beam Pattern of A Long Array From Subarray Beam Pattern Measurements

Sensors ◽  
2020 ◽  
Vol 20 (4) ◽  
pp. 1236
Author(s):  
Donghwan Jung ◽  
Jeasoo Kim
Keyword(s):  
Conventional Method ◽  
Field Condition ◽  
Near Field ◽  
Plane Waves ◽  
Measurement Data ◽  
Beam Pattern ◽  
Far Field ◽  
Water Tank ◽  
Discrete Line ◽  
Line Array

Beam pattern measurement is essential to verifying the performance of an array sonar. However, common problems in beam pattern measurement of arrays include constraints on achieving the far-field condition and reaching plane waves mainly due to limited measurement space as in acoustic water tank. For this purpose, the conventional method of measuring beam patterns in limited spaces, which transform near-field measurement data into far-field results, is used. However, the conventional method is time-consuming because of the dense spatial sampling. Hence, we devised a method to measure the beam pattern of a discrete line array in limited space based on the subarray method. In this method, a discrete line array with a measurement space that does not satisfy the far-field condition is divided into several subarrays, and the beam pattern of the line array can then be determined from the subarray measurements by the spatial convolution that is equivalent to the multiplication of beam pattern. The proposed method was verified through simulation and experimental measurement on a line array with 256 elements of 16 subarrays.

Analysis of a Pot-Like Ultrasonic Sensor with an Anisotropic Beam Pattern

2010 ◽  
Vol 26 (3) ◽  
pp. 373-384 ◽  
Author(s):  
C.-C. Cheng ◽  
C.-Y. Lin ◽  
J.-H. Ho ◽  
C.-S. Chen ◽  
J. Shieh ◽  
...  
Keyword(s):  
Resonant Frequency ◽  
Fourier Transforms ◽  
Numerical Models ◽  
Beam Width ◽  
Ultrasonic Sensor ◽  
Beam Pattern ◽  
Design Parameters ◽  
Far Field ◽  
Vertical Beam ◽  
Vibrating Plate

AbstractWe investigated the design parameters of a compact pot-like ultrasonic sensor which possesses a highly anisotropic beam pattern. As the sensor size is small due to its application constraint, the parameters are thus highly coupled to one another. We analyzed the respective effects of the parameters in the case where there is a vertical beam width reduction. The parameters investigated include resonant frequency, vibrating plate width-expanded angle, and ratio of thickness discontinuity of the vibrating plate. Numerical models developed by combining finite-element analysis and spatial Fourier transforms were adopted to predict the far-field radiating beam pattern of the various design configurations. The displacement distribution of the vibrating plate was measured using a microscopic laser Doppler vibrometer and the far-field pressure beam patterns were measured using a standard microphone in a semianechoic environment. The three configurations we used to validate the simulation model resulted in an H-V ratio of 2.67, 2.68 and 3.13, respectively which all agreed well with the numerical calculations. We found that by increasing the operating resonant frequency from 40kHz to 58kHz, the vertical far-field beam width of an ultrasonic sensor can be reduced by 31.62%. We found that the vertical beam width can be significantly reduced when the ratio of the thickness discontinuity of the vibrating plate decreases from 1 to 0.4 and is incorporated with its optimal width-expanded angle of the vibrating plate. It appears that an ultrasonic sensor with this type of anisotropic beam pattern can be ideally adopted for today's automotive applications.

Al-free cladding-layer blue laser diodes with a low aspect ratio in far-field beam pattern

2018 ◽  
Vol 39 (8) ◽  
pp. 084004 ◽  
Author(s):  
Meixin Feng ◽  
Qian Sun ◽  
Jianping Liu ◽  
Zengcheng Li ◽  
Yu Zhou ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
Laser Diodes ◽  
Beam Pattern ◽  
Blue Laser ◽  
Far Field ◽  
Low Aspect Ratio ◽  
Cladding Layer

Possible applications of fraunhofer holography in high resolution electron microscopy

1978 ◽  
Vol 36 (1) ◽  
pp. 222-223 ◽  
Author(s):  
N. Bonnet ◽  
M. Troyon ◽  
P. Gallion
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Transfer Function ◽  
Radiation Damage ◽  
High Resolution Electron Microscopy ◽  
Far Field ◽  
Field Region ◽  
Crystalline Materials ◽  
Resolution Electron ◽  
The Ideal

Two main problems in high resolution electron microscopy are first, the existence of gaps in the transfer function, and then the difficulty to find complex amplitude of the diffracted wawe from registered intensity. The solution of this second problem is in most cases only intended by the realization of several micrographs in different conditions (defocusing distance, illuminating angle, complementary objective apertures…) which can lead to severe problems of contamination or radiation damage for certain specimens.Fraunhofer holography can in principle solve both problems stated above (1,2). The microscope objective is strongly defocused (far-field region) so that the two diffracted beams do not interfere. The ideal transfer function after reconstruction is then unity and the twin image do not overlap on the reconstructed one.We show some applications of the method and results of preliminary tests.Possible application to the study of cavitiesSmall voids (or gas-filled bubbles) created by irradiation in crystalline materials can be observed near the Scherzer focus, but it is then difficult to extract other informations than the approximated size.

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