Development of a MEMS electrostatic condenser lens array for nc-Si surface electron emitters of the Massive Parallel Electron Beam Direct-Write system
Keyword(s):
1988 ◽
Vol 49
(C4)
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pp. C4-291-C4-294
2015 ◽
Vol 135
(6)
◽
pp. 221-229
Keyword(s):
Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies.
1996 ◽
Vol 9
(4)
◽
pp. 663-675
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2007 ◽
Vol 25
(6)
◽
pp. 2038
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2000 ◽
Vol 18
(6)
◽
pp. 3578
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