ELECTRON BEAM DIRECT WRITE EFFECTS ON CMOS DEVICES
1988 ◽
Vol 49
(C4)
◽
pp. C4-291-C4-294
2015 ◽
Vol 135
(6)
◽
pp. 221-229
Keyword(s):
Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies.
1996 ◽
Vol 9
(4)
◽
pp. 663-675
◽
2007 ◽
Vol 25
(6)
◽
pp. 2038
◽
2000 ◽
Vol 18
(6)
◽
pp. 3578
◽
2015 ◽
Vol 14
(3)
◽
pp. 031212
◽
Keyword(s):
Keyword(s):