Growth and optical properties of Bi2Ti2O7 single-crystal thin films on Si(100) by atmospheric pressure metalorganic chemical vapor deposition

1996 ◽  
Author(s):  
Hong Wang ◽  
Z. H. Wang ◽  
M. Wang ◽  
S. X. Shang
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Metalorganic Chemical

Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films

2006 ◽  
Vol 21 (7) ◽  
pp. 1632-1637 ◽  
Author(s):  
Maria Losurdo ◽  
Maria M. Giangregorio ◽  
A. Sacchetti ◽  
Pio Capezzuto ◽  
Giovanni Bruno ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Zno Thin Films ◽  
Zno Films ◽  
Chemical Vapor Deposition Growth ◽  
Metalorganic Chemical

ZnO thin films have been grown by metalorganic chemical vapor deposition (MOCVD) and plasma-assisted (PA) MOCVD on c-axis-oriented sapphire (0001) and Si (001) substrates using the novel Zn(2-thenoyltrifluoroacetonate)2·N,N,N′,N′-tetramethylethylendiamine precursor. The structural, morphological, and optical properties of ZnO films have been investigated. The results show that the O2 PA growth results in highly c-axis-oriented hexagonal ZnO thin films also on cubic substrates. PA-MOCVD ZnO films have good optical properties, as inferred by the presence of a sharp and intense exciton in the dielectric function.

Deposition of Potassium Niobate Thin Films by Metalorganic Chemical Vapor Deposition and their Nonlinear Optical Properties

1995 ◽  
Vol 392 ◽  
Author(s):  
M. J. Nystrom ◽  
B. W. Wessels ◽  
J. Chen ◽  
D. Studebaker ◽  
T. J. Marks ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Nonlinear Optical ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Nonlinear Optical Properties ◽  
Potassium Niobate ◽  
Metalorganic Chemical

AbstractFerroelectric potassium niobate thin films have been deposited by conventional, low pressure metalorganic chemical vapor deposition on several types of oxide substrates. The films were epitaxial with a c-axis orientation normal to the substrate. Atomic force microscopy revealed a surface roughness of 1 - 4 nm. Transmission electron microscopy showed the film/substrate interface to be semi-coherent with lattice misfit accommodated by misfit dislocations. The nonlinear optical properties of the KNbO3 films were measured by a transmission technique. The room temperature, effective second order nonlinear coefficient was 13 pm/V.

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