Morphology of silicon wafer surfaces: a comparative study with atomic force microscopy and other techniques

Author(s):  
Peter Wagner ◽  
H. A. Gerber ◽  
D. Graef ◽  
R. Schmolke ◽  
M. Suhren
2010 ◽  
Author(s):  
Xiaoning Xi ◽  
Jinjie Shi ◽  
Sahar Maghsoudy-Louyeh ◽  
Bernhard R. Tittmann ◽  
Donald O. Thompson ◽  
...  

1999 ◽  
Vol 5 (6) ◽  
pp. 413-419 ◽  
Author(s):  
Bernardo R.A. Neves ◽  
Michael E. Salmon ◽  
Phillip E. Russell ◽  
E. Barry Troughton

Abstract: In this work, we show how field emission–scanning electron microscopy (FE-SEM) can be a useful tool for the study of self-assembled monolayer systems. We have carried out a comparative study using FE-SEM and atomic force microscopy (AFM) to assess the morphology and coverage of self-assembled monolayers (SAM) on different substrates. The results show that FE-SEM images present the same qualitative information obtained by AFM images when the SAM is deposited on a smooth substrate (e.g., mica). Further experiments with rough substrates (e.g., Al grains on glass) show that FE-SEM is capable of unambiguously identifying SAMs on any type of substrate, whereas AFM has significant difficulties in identifying SAMs on rough surfaces.


2000 ◽  
Vol 154-155 ◽  
pp. 337-344 ◽  
Author(s):  
J. Flicstein ◽  
E. Guillonneau ◽  
J. Marquez ◽  
L.S. How Kee Chun ◽  
D. Maisonneuve ◽  
...  

1999 ◽  
Vol 38 (4) ◽  
pp. 684 ◽  
Author(s):  
Victor E. Asadchikov ◽  
Angela Duparré ◽  
Stefan Jakobs ◽  
Albert Yu. Karabekov ◽  
Igor V. Kozhevnikov ◽  
...  

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