Unimorph deformable mirror for oblique incidence applications

2021 ◽  
Author(s):  
Yinpeng Fan ◽  
Xin Zhang ◽  
Xiaoshuai Han ◽  
Qi Yao ◽  
Jianqiang Ma
2006 ◽  
Vol 133 ◽  
pp. 645-648 ◽  
Author(s):  
B. E. Kruschwitz ◽  
R. Jungquist ◽  
J. Qiao ◽  
S. Abbey ◽  
S. E. Dean ◽  
...  

2003 ◽  
Vol 762 ◽  
Author(s):  
Claudio J. Oton ◽  
Zeno Gaburro ◽  
Mher Ghulinyan ◽  
Nicola Daldosso ◽  
Lucio Pancheri ◽  
...  

AbstractWe report the observation of strongly anisotropic scattering of laser light at oblique incidence on (100)-oriented porous silicon layers. We performed angle-resolved light scattering measurements and three concentric rings were observed. Modeling porous silicon by means of nanometric columnar air pores and an effective anisotropic uniaxial dielectric constant explains the observed phenomenon, and besides, the observation of the angle aperture of these rings allows a direct measurement of relative birefringence. We finally study the changes of optical anisotropy after different modifications of the structure.


2003 ◽  
Vol 781 ◽  
Author(s):  
J. Gray ◽  
W. Schwarzacher ◽  
X.D. Zhu

AbstractWe studied the initial stages of the electrodeposition of Pb in the presence of chlorine ions on Cu(100), using an oblique-incidence optical reflectivity difference (OIRD) technique. The OI-RD results reveal that immediately following the underpotential deposition (UPD) of the first Pb monolayer, two different types of bulk-phase films grow depending upon the magnitude of overpotential and cyclic voltammetry (CV) scan rate. At low overpotentials and/or slow scan rates, we propose that a bulk-phase Pb film grows on top of the UPD monolayer. At high overpotentials and/or fast scan rates, either a PbO, PbCl2, or a rough Pb bulk-phase layer grows on top of the UPD layer such that the reflectivity difference signal from such a film has an opposite sign.


Author(s):  
Hongbin Yu ◽  
Haiqing Chen ◽  
Zimin Zhu ◽  
Chao Wang ◽  
Dacheng Zhang ◽  
...  
Keyword(s):  

Author(s):  
Y. Lu ◽  
E. Ramsay ◽  
C. Stockbridge ◽  
F. H. Koklu ◽  
A. Yurt ◽  
...  

Abstract We present a method for correcting spherical aberrations in solid immersion microscopy through the use of a deformable mirror. Aberrations in solid immersion imaging for failure analysis can be induced through off-axis imaging, errors in lens fabrication or mismatch of design and substrate wafer thickness. RMS wavefront error correction of 30% is demonstrated in the case of substrate wafer thickness error.


2020 ◽  
Vol 35 (11) ◽  
pp. 1110-1119
Author(s):  
Shuo CAO ◽  
◽  
Zhi-gao ZHANG ◽  
Zhi-yun ZHAO ◽  
Hu GU ◽  
...  

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