Top antireflective coating process for deep-UV lithography

1999 ◽  
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Binder K. Mann ◽  
Ronald J. Eakin ◽  
Pierre Silvestre ◽  
Brad Williams ◽  
...  
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2021 ◽  
Vol 3 (8) ◽  
pp. 2236-2244
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A novel super resolution deep UV lithography method is employed to fabricate large area plasmonic metasurfaces.


1999 ◽  
Author(s):  
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Yasuhiko Sato ◽  
Eishi Shiobara ◽  
Seiro Miyoshi ◽  
Hideto Matsuyama ◽  
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1993 ◽  
Author(s):  
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Malcolm C. Gower ◽  
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Lynn F. Fuller

2020 ◽  
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David Gonzalez-Andrade ◽  
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Miguel Montesinos Ballester ◽  
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Ting-En Hsieh ◽  
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Chia-Hua Chang ◽  
Huan-Chung Wang ◽  
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1990 ◽  
Author(s):  
George Schwartzkopf ◽  
Kathleen B. Gabriel ◽  
John B. Covington
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Author(s):  
R. D. Miller ◽  
G. Wallraff ◽  
N. Clecak ◽  
R. Sooriyakumaran ◽  
J. Michl ◽  
...  
Keyword(s):  

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