XLR 500i: recirculating ring ArF light source for immersion lithography

2007 ◽  
Author(s):  
D.J. W. Brown ◽  
P. O'Keeffe ◽  
V. B. Fleurov ◽  
R. Rokitski ◽  
R. Bergstedt ◽  
...  
Keyword(s):  
Light Source ◽  
Immersion Lithography

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

2008 ◽  
Author(s):  
Vladimir Fleurov ◽  
Slava Rokitski ◽  
Robert Bergstedt ◽  
Hong Ye ◽  
Kevin O’Brien ◽  
...  
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
Double Patterning

6 kHz MOPA light source for 193 nm immersion lithography

2005 ◽  
Author(s):  
Walter D. Gillespie ◽  
Toshihiko Ishihara ◽  
William N. Partlo ◽  
George X. Ferguson ◽  
Michael R. Simon
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
193 Nm

XLA-200: the third-generation ArF MOPA light source for immersion lithography

2005 ◽  
Author(s):  
Toshihiko Ishihara ◽  
Robert Rafac ◽  
Wayne J. Dunstan ◽  
Fedor Trintchouk ◽  
Christian Wittak ◽  
...  
Keyword(s):  
Light Source ◽  
Third Generation ◽  
Immersion Lithography ◽  
The Third

Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield

2021 ◽  
Author(s):  
Hirotaka Miyamoto ◽  
Takamitsu Komaki ◽  
Toshihiro Ohga ◽  
Taku Yamazaki ◽  
Tsukasa Hori ◽  
...  
Keyword(s):  
Light Source ◽  
Speckle Reduction ◽  
Immersion Lithography

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

2006 ◽  
Author(s):  
Satoshi Tanaka ◽  
Hiroaki Tsushima ◽  
Takanori Nakaike ◽  
Taku Yamazaki ◽  
Takashi Saito ◽  
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Keyword(s):  
Light Source ◽  
Laser Light ◽  
Immersion Lithography ◽  
Dry Immersion ◽  
Injection Lock ◽  
Laser Light Source

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

2007 ◽  
Author(s):  
Toru Suzuki ◽  
Kouji Kakizaki ◽  
Takashi Matsunaga ◽  
Satoshi Tanaka ◽  
Yasufumi Kawasuji ◽  
...  
Keyword(s):  
Light Source ◽  
Laser Light ◽  
Immersion Lithography ◽  
Injection Lock ◽  
Laser Light Source

Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

2009 ◽  
Author(s):  
Slava Rokitski ◽  
Toshi Ishihara ◽  
Rajeskar Rao ◽  
Rui Jiang ◽  
Daniel Riggs ◽  
...  
Keyword(s):  
Light Source ◽  
High Volume ◽  
Immersion Lithography ◽  
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Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

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Author(s):  
Rostislav Rokitski ◽  
Vladimir Fleurov ◽  
Robert Bergstedt ◽  
Hong Ye ◽  
Robert Rafac ◽  
...  
Keyword(s):  
Light Source ◽  
High Volume ◽  
Immersion Lithography ◽  
Double Patterning
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