Oriented Growth PLT Thin Films On Amorphous Substrates

Author(s):  
Yuhang Huang ◽  
Weigen Luo ◽  
Aili Din ◽  
Ming Ge ◽  
Xiantong Chen
1998 ◽  
Vol 47 (2) ◽  
pp. 239
Author(s):  
WU ZHUANG-CHUN ◽  
HU WEI-SHENG ◽  
LIU JUN-MING ◽  
WANG MU ◽  
LIU ZHI-GUO

1991 ◽  
Vol 6 (11) ◽  
pp. 2264-2271 ◽  
Author(s):  
R. Ramesh ◽  
A. Inam ◽  
D.M. Hwang ◽  
T.S. Ravi ◽  
T. Sands ◽  
...  

We have examined the atomic structure of growth interfaces in thin films of Y–Ba–Cu–O grown on [001] perovskite or cubic substrates. At substrate heater temperatures in the range of 780–820 °C c-axis oriented growth is observed on these substrates. On SrTiO3, the first layer appears to be either a BaO or a CuO2 plane while on LaAlO3 the first layer appears to be a CuO chain layer. The mismatch on the a-b plane is accommodated by the formation of interface dislocations. Defects on the substrate surface propagate as defects in the film. These defects are primarily translational boundaries and in some cases second phases. At lower substrate heater temperatures, i.e., 650–700 °C, a, b-axis growth dominates. Defects and steps on the substrate surface are more detrimental in the growth of a, b-axis oriented films, since they tend to favor the nucleation of c-axis oriented domains. This is ascribed to the ledge mechanism of c-axis film growth, for which the surface steps are good nucleation sites.


2019 ◽  
Vol 672 ◽  
pp. 138-145 ◽  
Author(s):  
E. Flores ◽  
S. Yoda ◽  
C. Morales ◽  
O. Caballero-Calero ◽  
P. Díaz-Chao ◽  
...  

2014 ◽  
Vol 115 (19) ◽  
pp. 193505 ◽  
Author(s):  
P. M. Mayrhofer ◽  
C. Eisenmenger-Sittner ◽  
M. Stöger-Pollach ◽  
H. Euchner ◽  
A. Bittner ◽  
...  

2019 ◽  
Vol 58 (21) ◽  
pp. 6886-6890 ◽  
Author(s):  
Ken Ikigaki ◽  
Kenji Okada ◽  
Yasuaki Tokudome ◽  
Takashi Toyao ◽  
Paolo Falcaro ◽  
...  

1998 ◽  
Vol 526 ◽  
Author(s):  
J. Gottmann ◽  
T. Klotzbücher ◽  
B. Vosseler ◽  
E. W. Kreutz

AbstractKrF excimer laser radiation (λ=248 nm, τ=25 ns) is used for pulsed laser deposition of BaTiO3 thin films on Pt/Ti/Si multilayer substrates. The processing gas atmosphere consists of O2 at typical pressures of p=10-3-5·10-1 mbar. The investigations concentrate on the influence of the substrate temperature and the kinetic energy of the film forming particles on the crystalline structure and orientation of the growing films.X-ray diffraction measurements and polarization dependent micro Raman spectroscopy reveal oriented growth of the films with c-axis orientation normal to the substrate surface and [100] texture if the energy of the particles is > 60 eV, while at lower kinetic energies a [110] or [111] texture with partly a-axis orientation is preferred. The ferroelectricity and the dielectric constant of the films, as determined by polarization versus voltage (P-V) and capacitance versus voltage (C-V) impedance measurements, decreases with increasing kinetic energy of the film forming particles. This decrease of the dielectric properties correlates with the change of the preferred orientation and the crystalline quality of the films.


2016 ◽  
Vol 34 (3) ◽  
pp. 555-563 ◽  
Author(s):  
Dongyun Guo ◽  
Yang Ju ◽  
Chengju Fu ◽  
Zhixiong Huang ◽  
Lianmeng Zhang

AbstractZinc acetate was used as a starting material to prepare Zn-solutions from solvents and ligands with different boiling temperature. The ZnO thin films were prepared on Si(1 0 0) substrates by spin-coating method. The effect of baking temperature and boiling temperature of the solvents and ligands on their morphologies and orientation was investigated. The solvents and ligands with high boiling temperature were favorable for relaxation of mechanical stress to form the smooth ZnO thin films. As the solvents and ligands with low boiling temperature were used to prepare Zn-solutions, the prepared ZnO thin films showed (0 0 2) preferred orientation. As n-propanol, 2-methoxyethanol, 2-(methylamino)ethanol and monoethanolamine were used to prepare Zn-solutions, highly (0 0 2)-oriented ZnO thin films were formed by adjusting the baking temperature.


1996 ◽  
Vol 69 (12) ◽  
pp. 1719-1721 ◽  
Author(s):  
Seshu B. Desu ◽  
Dilip P. Vijay ◽  
X. Zhang ◽  
BaoPing He

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