Regularities of remote plasma enhanced chemical vapor deposition of silicon nitride films
2015 ◽
Vol 85
(5)
◽
pp. 1238-1251
Keyword(s):
2007 ◽
Vol 38
(1-2)
◽
pp. 148-151
◽
1990 ◽
Vol 29
(Part 1, No. 5)
◽
pp. 918-922
◽
Preparation of Plasma Chemical Vapor Deposition Silicon Nitride Films from SiH2F2and NH3Source Gases
1991 ◽
Vol 30
(Part 2, No. 4A)
◽
pp. L619-L621
◽