Feasibility Study on High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography

Ultraviolet Lithography ◽

Chemically Amplified ◽

Feasibility study of sub-10-nm-half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: II. Stochastic effects

10.7567/jjap.54.036507 ◽

2015 ◽

Vol 54 (3) ◽

pp. 036507 ◽

Cited By ~ 4

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Feasibility Study ◽

Extreme Ultraviolet ◽

Stochastic Effects ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model

10.7567/jjap.53.106501 ◽

2014 ◽

Vol 53 (10) ◽

pp. 106501 ◽

Cited By ~ 9

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Image Quality ◽

Probability Density ◽

Feasibility Study ◽

Extreme Ultraviolet ◽

Density Model ◽

Latent Image ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography

10.7567/jjap.53.066504 ◽

2014 ◽

Vol 53 (6) ◽

pp. 066504 ◽

Cited By ~ 2

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Theoretical Study ◽

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Defect Generation ◽

Chemically Amplified ◽

Dependence of stochastic defect generation on quantum efficiency of acid generation and effective reaction radius for deprotection in chemically amplified resist process using extreme ultraviolet lithography

10.7567/jjap.53.076502 ◽

2014 ◽

Vol 53 (7) ◽

pp. 076502 ◽

Cited By ~ 1

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Quantum Efficiency ◽

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Defect Generation ◽

Acid Generation ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Effective Reaction

Effect of molecular weight and protection ratio on line edge roughness and stochastic defect generation in chemically amplified resist processes of extreme ultraviolet lithography

10.7567/jjap.53.084002 ◽

2014 ◽

Vol 53 (8) ◽

pp. 084002 ◽

Cited By ~ 2

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Molecular Weight ◽

Extreme Ultraviolet ◽

Line Edge Roughness ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Edge Roughness ◽

Chemically Amplified Resist ◽

On Line ◽

Protection Ratio

Relationships between Stochastic Phenomena and Optical Contrast in Chemically Amplified Resist Process of Extreme Ultraviolet Lithography

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.27.11 ◽

2014 ◽

Vol 27 (1) ◽

pp. 11-19 ◽

Cited By ~ 1

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Extreme Ultraviolet ◽

Optical Contrast ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Stochastic Phenomena

Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography

10.1143/jjap.49.066504 ◽

2010 ◽

Vol 49 (6) ◽

pp. 066504 ◽

Cited By ~ 44

Author(s):

Takahiro Kozawa ◽

Hiroaki Oizumi ◽

Toshiro Itani ◽

Seiichi Tagawa

Keyword(s):

Line Width ◽

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Edge Roughness ◽

Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography

10.1143/jjap.44.5866 ◽

2005 ◽

Vol 44 (7B) ◽

pp. 5866-5870 ◽

Cited By ~ 10

Author(s):

Takeo Watanabe ◽

Hideo Hada ◽

Seung Yoon Lee ◽

Hiroo Kinoshita ◽

Kazuhiro Hamamoto ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Feasibility Study of Chemically Amplified Resists for Short Wavelength Extreme Ultraviolet Lithography

Applied Physics Express ◽

10.1143/apex.4.026501 ◽

2011 ◽

Vol 4 (2) ◽

pp. 026501 ◽

Cited By ~ 5

Author(s):

Takahiro Kozawa ◽

Andreas Erdmann

Keyword(s):

Feasibility Study ◽

Short Wavelength ◽

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Chemically Amplified Resists

Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography

Applied Physics Express ◽

10.1143/apex.1.047001 ◽

2008 ◽

Vol 1 ◽

pp. 047001 ◽

Cited By ~ 37

Author(s):

Hiroki Yamamoto ◽

Takahiro Kozawa ◽

Seiichi Tagawa ◽

Hiroto Yukawa ◽

Mitsuru Sato ◽

...

Keyword(s):

Acid Production ◽

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽