Relationships between Stochastic Phenomena and Optical Contrast in Chemically Amplified Resist Process of Extreme Ultraviolet Lithography

Optical Contrast ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Stochastic Phenomena

Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography

10.7567/jjap.53.066504 ◽

2014 ◽

Vol 53 (6) ◽

pp. 066504 ◽

Cited By ~ 2

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Theoretical Study ◽

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Defect Generation ◽

Chemically Amplified ◽

Dependence of stochastic defect generation on quantum efficiency of acid generation and effective reaction radius for deprotection in chemically amplified resist process using extreme ultraviolet lithography

10.7567/jjap.53.076502 ◽

2014 ◽

Vol 53 (7) ◽

pp. 076502 ◽

Cited By ~ 1

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Quantum Efficiency ◽

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Defect Generation ◽

Acid Generation ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Effective Reaction

Effect of molecular weight and protection ratio on line edge roughness and stochastic defect generation in chemically amplified resist processes of extreme ultraviolet lithography

10.7567/jjap.53.084002 ◽

2014 ◽

Vol 53 (8) ◽

pp. 084002 ◽

Cited By ~ 2

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Molecular Weight ◽

Extreme Ultraviolet ◽

Line Edge Roughness ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Edge Roughness ◽

Chemically Amplified Resist ◽

On Line ◽

Protection Ratio

Feasibility study of sub-10-nm-half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: II. Stochastic effects

10.7567/jjap.54.036507 ◽

2015 ◽

Vol 54 (3) ◽

pp. 036507 ◽

Cited By ~ 4

Author(s):

Takahiro Kozawa ◽

Julius Joseph Santillan ◽

Toshiro Itani

Keyword(s):

Feasibility Study ◽

Extreme Ultraviolet ◽

Stochastic Effects ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Study on stochastic phenomena induced in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist (high performance model resist for extreme ultraviolet lithography)

10.1117/12.2218839 ◽

2016 ◽

Author(s):

Takahiro Kozawa ◽

Julius J. Santillan ◽

Toshiro Itani

Keyword(s):

High Performance ◽

Extreme Ultraviolet ◽

Performance Model ◽

Butyl Methacrylate ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Stochastic Phenomena

Feasibility Study on High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography

Applied Physics Express ◽

10.1143/apex.1.067012 ◽

2008 ◽

Vol 1 ◽

pp. 067012 ◽

Cited By ~ 27

Author(s):

Takahiro Kozawa ◽

Kazumasa Okamoto ◽

Jun Nakamura ◽

Seiichi Tagawa

Keyword(s):

Feasibility Study ◽

Extreme Ultraviolet ◽

High Sensitivity ◽

Absorption Enhancement ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography

10.1143/jjap.49.066504 ◽

2010 ◽

Vol 49 (6) ◽

pp. 066504 ◽

Cited By ~ 44

Author(s):

Takahiro Kozawa ◽

Hiroaki Oizumi ◽

Toshiro Itani ◽

Seiichi Tagawa

Keyword(s):

Line Width ◽

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Edge Roughness ◽

Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography

10.1143/jjap.44.5866 ◽

2005 ◽

Vol 44 (7B) ◽

pp. 5866-5870 ◽

Cited By ~ 10

Author(s):

Takeo Watanabe ◽

Hideo Hada ◽

Seung Yoon Lee ◽

Hiroo Kinoshita ◽

Kazuhiro Hamamoto ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography

Applied Physics Express ◽

10.1143/apex.1.047001 ◽

2008 ◽

Vol 1 ◽

pp. 047001 ◽

Cited By ~ 37

Author(s):

Hiroki Yamamoto ◽

Takahiro Kozawa ◽

Seiichi Tagawa ◽

Hiroto Yukawa ◽

Mitsuru Sato ◽

...

Keyword(s):

Acid Production ◽

Extreme Ultraviolet ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography

10.1143/jjap.46.l979 ◽

2007 ◽

Vol 46 (No. 40) ◽

pp. L979-L981 ◽

Cited By ~ 92

Author(s):

Ryo Hirose ◽

Takahiro Kozawa ◽

Seiichi Tagawa ◽

Toshiyuki Kai ◽

Tsutomu Shimokawa

Keyword(s):

Absorption Coefficient ◽

Extreme Ultraviolet ◽

Generation Efficiency ◽

Ultraviolet Lithography ◽

Acid Generation ◽

Chemically Amplified ◽