Fabrication and Characterization of Multilayer Zone Plate for Hard X-Rays

B4C-based multilayers have important applications for soft to hard X-rays. In this paper, X-ray grazing-incidence reflectivity and diffuse scattering, combining various analysis methods, were used to characterize the structure of B4C-based multilayers including layer thickness, density, interfacial roughness, interdiffusion, correlation length,etc.Quantitative results for W/B4C, Mo/B4C and La/B4C multilayers were compared. W/B4C multilayers show the sharpest interfaces and most stable structures. The roughness replications of La/B4C and Mo/B4C multilayers are not strong, and oxidations and structure expansions are found in the aging process. This work provides guidance for future fabrication and characterization of B4C-based multilayers.

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Ronchi test for characterization of X-ray nanofocusing optics and beamlines

Journal of Synchrotron Radiation ◽

10.1107/s160057751401323x ◽

2014 ◽

Vol 21 (5) ◽

pp. 1105-1109 ◽

Cited By ~ 15

Author(s):

Fredrik Uhlén ◽

Jussi Rahomäki ◽

Daniel Nilsson ◽

Frank Seiboth ◽

Claude Sanz ◽

...

Keyword(s):

Qualitative Data ◽

Spatial Coherence ◽

Zone Plate ◽

Stability Characteristic ◽

X Rays ◽

Temperature Drift ◽

X Ray ◽

Interference Fringes ◽

Refractive Lens

A Ronchi interferometer for hard X-rays is reported in order to characterize the performance of the nanofocusing optics as well as the beamline stability. Characteristic interference fringes yield qualitative data on present aberrations in the optics. Moreover, the visibility of the fringes on the detector gives information on the degree of spatial coherence in the beamline. This enables the possibility to detect sources of instabilities in the beamline like vibrations of components or temperature drift. Examples are shown for two different nanofocusing hard X-ray optics: a compound refractive lens and a zone plate.

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Characterization of the sputtered-sliced zone plate for high energy X-rays

Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment ◽

10.1016/s0168-9002(01)00501-0 ◽

2001 ◽

Vol 467-468 ◽

pp. 868-871

Author(s):

N. Kamijo ◽

Y. Suzuki ◽

M. Awaji ◽

A. Takeuchi ◽

K. Uesugi ◽

...

Keyword(s):

High Energy ◽

Zone Plate ◽

X Rays

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Fabrication and characterization of Tungsten zone plates for multi KeV X-rays

10.1063/1.1291221 ◽

2000 ◽

Cited By ~ 7

Author(s):

P. Charalambous

Keyword(s):

X Rays ◽

Zone Plates ◽

Fabrication And Characterization

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Digital x-ray mapping of nanometer-size supported bimetallic catalysts

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100104716 ◽

1988 ◽

Vol 46 ◽

pp. 530-531

Author(s):

L. T. Germinario

Keyword(s):

Background Radiation ◽

Metal Cluster ◽

Single Element ◽

Beam Diameter ◽

X Rays ◽

X Ray ◽

Major Interest ◽

Induced Changes

Understanding the role of metal cluster composition in determining catalytic selectivity and activity is of major interest in heterogeneous catalysis. The electron microscope is well established as a powerful tool for ultrastructural and compositional characterization of support and catalyst. Because the spatial resolution of x-ray microanalysis is defined by the smallest beam diameter into which the required number of electrons can be focused, the dedicated STEM with FEG is the instrument of choice. The main sources of errors in energy dispersive x-ray analysis (EDS) are: (1) beam-induced changes in specimen composition, (2) specimen drift, (3) instrumental factors which produce background radiation, and (4) basic statistical limitations which result in the detection of a finite number of x-ray photons. Digital beam techniques have been described for supported single-element metal clusters with spatial resolutions of about 10 nm. However, the detection of spurious characteristic x-rays away from catalyst particles produced images requiring several image processing steps.

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Characterization of Rh/Si multilayer structure by HREM and HAADF

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100121016 ◽

1992 ◽

Vol 50 (1) ◽

pp. 122-123

Author(s):

Y. Cheng ◽

J. Liu ◽

M.B. Stearns ◽

D.G. Steams

Keyword(s):

Normal Incidence ◽

High Resolution Electron Microscopy ◽

X Rays ◽

Beam Direction ◽

Cross Sectional ◽

Optical Elements ◽

Resolution Electron ◽

Point To Point ◽

Better Than

The Rh/Si multilayer (ML) thin films are promising optical elements for soft x-rays since they have a calculated normal incidence reflectivity of ∼60% at a x-ray wavelength of ∼13 nm. However, a reflectivity of only 28% has been attained to date for ML fabricated by dc magnetron sputtering. In order to determine the cause of this degraded reflectivity the microstructure of this ML was examined on cross-sectional specimens with two high-resolution electron microscopy (HREM and HAADF) techniques.Cross-sectional specimens were made from an as-prepared ML sample and from the same ML annealed at 298 °C for 1 and 100 hours. The specimens were imaged using a JEM-4000EX TEM operating at 400 kV with a point-to-point resolution of better than 0.17 nm. The specimens were viewed along Si [110] projection of the substrate, with the (001) Si surface plane parallel to the beam direction.

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