Reduction in Microloading by High-Gas-Flow-Rate Electron Cyclotron Resonance Plasma Etching
1995 ◽
Vol 34
(Part 1, No. 5A)
◽
pp. 2489-2494
◽
2002 ◽
Vol 31
(7)
◽
pp. 749-753
◽
2017 ◽
Vol 35
(6)
◽
pp. 061303
◽
1996 ◽
Vol 14
(5)
◽
pp. 2827-2834
◽
1995 ◽
Vol 24
(9)
◽
pp. 1201-1206
◽
2000 ◽
Vol 18
(4)
◽
pp. 1903