Low-Temperature Growth of Polycrystalline silicon Films by SiCl 4 /H 2 rf Plasma Enhanced Chemical Vapour Deposition

2003 ◽  
Vol 20 (10) ◽  
pp. 1879-1882 ◽  
Author(s):  
Lin Xuan-Ying ◽  
Huang Chuang-Jun ◽  
Lin Kui-Xun ◽  
Yu Yun-Peng ◽  
Yu Chu-Ying ◽  
...  
Keyword(s):  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Polycrystalline Silicon ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Silicon Films ◽  
Rf Plasma ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Polycrystalline Silicon Films

scholarly journals Low Temperature Growth of Polycrystalline Silicon Films by RF Sputtering Method(1st Report).

1995 ◽  
Vol 61 (6) ◽  
pp. 829-833
Author(s):  
Hiroaki KAKIUCHI ◽  
Hideaki KAWABE ◽  
Kumayasu YOSHII ◽  
Kiyoshi YASUTAKE ◽  
Akihiro TAKEUCHI ◽  
...  
Keyword(s):  
Low Temperature ◽  
Polycrystalline Silicon ◽  
Rf Sputtering ◽  
Silicon Films ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Polycrystalline Silicon Films

Low-temperature growth of graphene nanoplatelets by hot-wire chemical vapour deposition

2021 ◽  
Vol 411 ◽  
pp. 126995
Author(s):  
Nur Afira binti Anuar ◽  
Nurul Hidayah Mohamad Nor ◽  
Rozidawati binti Awang ◽  
Hideki Nakajima ◽  
Sarayut Tunmee ◽  
...  
Keyword(s):  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Graphene Nanoplatelets ◽  
Hot Wire ◽  
Temperature Growth ◽  
Low Temperature Growth
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