Diffusion Barrier Characteristics of Hf(C,N) Thin Films Deposited by Plasma Enhanced Metal Organic Chemical Vapor Deposition for Cu Metallization
1998 ◽
Vol 37
(Part 2, No. 4A)
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pp. L406-L408
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2002 ◽
Vol 41
(Part 1, No. 10)
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pp. 6153-6164
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1995 ◽
Vol 78
(2)
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pp. 337-341
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2004 ◽
Vol 110
(1)
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pp. 34-37
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2003 ◽
Vol 42
(Part 1, No. 5A)
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pp. 2839-2842
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1999 ◽
Vol 17
(3)
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pp. 1101
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1994 ◽
Vol 9
(7)
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pp. 1721-1727
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2013 ◽
Vol 16
(5)
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pp. 1297-1302
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