Pb-Diffusion Barrier Layers for PbTiO3 Thin Films Deposited on Si Substrates by Metal Organic Chemical Vapor Deposition

Diffusion Barrier ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Barrier Layers ◽

Si Substrates ◽

Metal Organic ◽

Diffusion Barrier Characteristics of Hf(C,N) Thin Films Deposited by Plasma Enhanced Metal Organic Chemical Vapor Deposition for Cu Metallization

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.l406 ◽

1998 ◽

Vol 37 (Part 2, No. 4A) ◽

pp. L406-L408 ◽

Cited By ~ 8

Author(s):

Woo-Cheol Roh ◽

Donggeun Jung

Keyword(s):

Thin Films ◽

Diffusion Barrier ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Cu Metallization ◽

Metal Organic ◽

Dysprosium Scandate Thin Films Prepared by Metal Organic Chemical Vapor Deposition on Pt/TiOx/SiO2/Si Substrates for MIM Capacitor Applications.

ECS Transactions ◽

10.1149/1.2779588 ◽

2019 ◽

Vol 11 (4) ◽

pp. 529-540 ◽

Cited By ~ 4

Author(s):

Reji Thomas ◽

Naba K. Karan ◽

Peter Ehrhart ◽

Rainer Waser ◽

Ram S Katiyar

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Si Substrates ◽

Metal Organic ◽

Dysprosium Scandate Thin Films Prepared by Metal Organic Chemical Vapor Deposition on Pt/Ti/SiO2/Si Substrates for MIM Capacitor Applications.

ECS Meeting Abstracts ◽

10.1149/ma2007-02/20/1151 ◽

2007 ◽

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Si Substrates ◽

Metal Organic ◽

Transformer Coupled Plasma Enhanced Metal Organic Chemical Vapor Deposition of Ta(Si)N Thin Films and Their Cu Diffusion Barrier Properties

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.6153 ◽

2002 ◽

Vol 41 (Part 1, No. 10) ◽

pp. 6153-6164 ◽

Cited By ~ 11

Author(s):

Hye-Lyun Park ◽

Kyung-Mun Byun ◽

Won-Jong Lee

Keyword(s):

Thin Films ◽

Diffusion Barrier ◽

Vapor Deposition ◽

Chemical Vapor ◽

Barrier Properties ◽

Organic Chemical ◽

Metal Organic ◽

Cu Diffusion Barrier ◽

Route from ZnO Thin Films to Nanostructures on Si Substrates by Metal Organic Chemical Vapor Deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.51.207 ◽

2007 ◽

Vol 51 (96) ◽

pp. 207 ◽

Cited By ~ 1

Author(s):

Sang-Woo KIM ◽

Han-Ki KIM ◽

Soon-Wook JEONG ◽

Shizuo FUJITA ◽

Kyoung-Kook KIM

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Zno Thin Films ◽

Organic Chemical ◽

Si Substrates ◽

Metal Organic ◽

Growth of gallium oxide thin films on silicon by the metal organic chemical vapor deposition method

Materials Science and Engineering B ◽

10.1016/j.mseb.2004.01.012 ◽

2004 ◽

Vol 110 (1) ◽

pp. 34-37 ◽

Cited By ~ 47

Author(s):

Hyoun Woo Kim ◽

Nam Ho Kim

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Gallium Oxide ◽

Chemical Vapor ◽

Organic Chemical ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Metal Organic ◽

Domain structure of epitaxial PbTiO3 thin films on LaAlO3(100) grown by metal organic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.369203 ◽

1999 ◽

Vol 85 (2) ◽

pp. 853-860 ◽

Cited By ~ 12

Author(s):

Bi Ming Yen ◽

Haydn Chen

Keyword(s):

Thin Films ◽

Domain Structure ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Transparent conducting indium oxide thin films grown by low-temperature metal organic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2006.08.030 ◽

2007 ◽

Vol 515 (5) ◽

pp. 2921-2925 ◽

Cited By ~ 27

Author(s):

Chunyu Wang ◽

Volker Cimalla ◽

Genady Cherkashinin ◽

Henry Romanus ◽

Majdeddin Ali ◽

...

Keyword(s):

Thin Films ◽

Low Temperature ◽

Indium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Transparent Conducting ◽

Metal Organic ◽

Study on ZrO2:Er Thin Films Fabricated by Metal-Organic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.2839 ◽

2003 ◽

Vol 42 (Part 1, No. 5A) ◽

pp. 2839-2842 ◽

Cited By ~ 2

Author(s):

Jeong Hoon Park ◽

Kug Sun Hong ◽

Woon Jo Cho ◽

Jang-Hoon Chung

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Low temperature metal-organic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization

10.1116/1.590703 ◽

1999 ◽

Vol 17 (3) ◽

pp. 1101 ◽

Cited By ~ 41

Author(s):

Jean E. Kelsey ◽

Cindy Goldberg ◽

Guillermo Nuesca ◽

Gregory Peterson ◽

Alain E. Kaloyeros ◽

...

Keyword(s):

Low Temperature ◽

Diffusion Barrier ◽

Vapor Deposition ◽

Chemical Vapor ◽

Copper Metallization ◽

Organic Chemical ◽

Tungsten Nitride ◽

Metal Organic ◽