Metal–Oxide–Semiconductor-Diode Characteristics with SiO2Films Formed by Oxidation and Sputtering Using Electron-Cyclotron-Resonance-Plasma Stream

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.1031 ◽

2005 ◽

Vol 44 (2) ◽

pp. 1031-1036

Author(s):

Kunio Saito ◽

Yoshito Jin ◽

Toshiro Ono ◽

Masaru Shimada

Keyword(s):

Metal Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Metal Oxide Semiconductor ◽

Electron Cyclotron ◽

Oxide Semiconductor ◽

Semiconductor Diode ◽

Plasma Stream ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Impact of InGaAs surface nitridation on interface properties of InGaAs metal-oxide-semiconductor capacitors using electron cyclotron resonance plasma sputtering SiO2

Applied Physics Letters ◽

10.1063/1.3464170 ◽

2010 ◽

Vol 97 (13) ◽

pp. 132102 ◽

Author(s):

T. Hoshii ◽

M. Yokoyama ◽

H. Yamada ◽

M. Hata ◽

T. Yasuda ◽

...

Keyword(s):

Metal Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Metal Oxide Semiconductor ◽

Electron Cyclotron ◽

Oxide Semiconductor ◽

Interface Properties ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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MOS-diode characteristics of ultrathin Al[sub 2]O[sub 3] gate dielectrics after exposure to an electron-cyclotron-resonance plasma stream

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1941250 ◽

2005 ◽

Vol 23 (4) ◽

pp. 1480 ◽

Author(s):

Yoshito Jin ◽

Kunio Saito ◽

Masaru Shimada ◽

Toshiro Ono

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Gate Dielectrics ◽

Electron Cyclotron ◽

Plasma Stream ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance ion stream etching with high uniformity and accuracy for metal–oxide–semiconductor gate fabrication

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587510 ◽

1994 ◽

Vol 12 (6) ◽

pp. 3347 ◽

Author(s):

Chiharu Takahashi

Keyword(s):

Metal Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Metal Oxide Semiconductor ◽

Electron Cyclotron ◽

Oxide Semiconductor ◽

High Uniformity

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An electron cyclotron resonance plasma stream source for low pressure thin film production

Surface and Coatings Technology ◽

10.1016/0257-8972(88)90032-1 ◽

1988 ◽

Vol 36 (3-4) ◽

pp. 917-925 ◽

Author(s):

O.A. Popov

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Low Pressure ◽

Electron Cyclotron ◽

Plasma Stream ◽

Film Production ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Thin Film Production

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Low-Temperature Silicon Oxidation with Very Small Activation Energy and High-Quality Interface by Electron Cyclotron Resonance Plasma Stream Irradiation

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.l765 ◽

2004 ◽

Vol 43 (No. 6B) ◽

pp. L765-L767 ◽

Author(s):

Kunio Saito ◽

Yoshito Jin ◽

Toshiro Ono ◽

Masaru Shimada

Keyword(s):

Activation Energy ◽

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Stream ◽

High Quality ◽

Silicon Oxidation ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma stream source for plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575820 ◽

1989 ◽

Vol 7 (3) ◽

pp. 914-917 ◽

Author(s):

O. A. Popov ◽

H. Waldron

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Stream ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

Applied Physics Letters ◽

10.1063/1.102487 ◽

1990 ◽

Vol 56 (15) ◽

pp. 1424-1426 ◽

Author(s):

S. J. Pearton ◽

U. K. Chakrabarti ◽

A. P. Kinsella ◽

D. Johnson ◽

C. Constantine

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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X-ray photoelectron diffraction observation of β-SiC(001) obtained by electron cyclotron resonance plasma assisted growth on Si(001)

Applied Surface Science ◽

10.1016/0169-4332(93)90239-8 ◽

1993 ◽

Vol 68 (4) ◽

pp. 575-582 ◽

Author(s):

M. Diani ◽

J.L. Bischoff ◽

L. Kubler ◽

D. Bolmont

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Photoelectron Diffraction ◽

Resonance Plasma

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Low-temperature deposition of high-quality silicon dioxide films by sputtering-type electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580664 ◽

1997 ◽

Vol 15 (4) ◽

pp. 1951-1954 ◽

Author(s):

H. Nakashima ◽

K. Furukawa ◽

Y. C. Liu ◽

D. W. Gao ◽

Y. Kashiwazaki ◽

...

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Resonance Plasma

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