Electrical Characterization of Germanium Oxide/Germanium Interface Prepared by Electron-Cyclotron-Resonance Plasma Irradiation

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.6981 ◽

2005 ◽

Vol 44 (9B) ◽

pp. 6981-6984 ◽

Author(s):

Yukio Fukuda ◽

Tomoo Ueno ◽

Shigeru Hirono ◽

Satoshi Hashimoto

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electrical Characterization ◽

Electron Cyclotron ◽

Germanium Oxide ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Irradiation ◽

Resonance Plasma

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Characterization of He-induced Bubble Formation in Tungsten due to Exposure from an Electron Cyclotron Resonance Plasma Source

Fusion Science & Technology ◽

10.1080/15361055.2017.1333856 ◽

2017 ◽

pp. 1-10 ◽

Author(s):

D. Donovan ◽

D. Buchenauer ◽

J. Whaley ◽

G. Wright ◽

C.M. Parish ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Bubble Formation ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Picosecond time-resolved photoluminescence characterization of a-SiC:H films prepared by electron cyclotron resonance plasma

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(05)80255-8 ◽

1991 ◽

Vol 137-138 ◽

pp. 859-862 ◽

Author(s):

S. Gangopadhyay ◽

M. Pleil ◽

W. Borst ◽

C. Young ◽

M. Kristiansen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Time Resolved ◽

Time Resolved Photoluminescence ◽

Resonance Plasma

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Characterization of a high-density electron-cyclotron resonance plasma source operating in nitrogen

Review of Scientific Instruments ◽

10.1063/1.1578154 ◽

2003 ◽

Vol 74 (7) ◽

pp. 3279-3283 ◽

Author(s):

E. I. Toader ◽

A. Fredriksen ◽

A. Aanesland

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Characterization of a large volume electron cyclotron resonance plasma for etching and deposition of materials

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578239 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1276-1280 ◽

Author(s):

A. Ghanbari ◽

M. S. Ameen ◽

R. S. Heinrich

Keyword(s):

Large Volume ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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00/02894 Preparation and characterization of ZrF4-BaF2-EuF3 planar glass films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Fuel and Energy Abstracts ◽

10.1016/s0140-6701(00)96807-3 ◽

2000 ◽

Vol 41 (5) ◽

pp. 319-320

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

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ChemInform Abstract: The Characterization of Electron Cyclotron Resonance Plasma Deposited Silicon Nitride and Silicon Oxide Films

10.1002/chin.199002353 ◽

1990 ◽

Vol 21 (2) ◽

Author(s):

NGUYEN SON VAN NGUYEN SON VAN ◽

K. ALBAUGH

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Characterization of GaAs(110) Nitrided by an Electron-Cyclotron Resonance Plasma Source Using N[sub 2]

Journal of The Electrochemical Society ◽

10.1149/1.1393260 ◽

2000 ◽

Vol 147 (2) ◽

pp. 731

Author(s):

D. Landheer ◽

K. Rajesh ◽

J. E. Hulse ◽

G. I. Sproule ◽

J. McCaffrey ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Modeling and characterization of etching in electron cyclotron resonance plasma reactors

Journal of Fusion Energy ◽

10.1007/bf01054828 ◽

1993 ◽

Vol 12 (4) ◽

pp. 403-404

Author(s):

Martin Lampe

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Reactors ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Etching rate characterization of SiO2 and Si using ion energy flux and atomic fluorine density in a CF4/O2/Ar electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578540 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1283-1288 ◽

Author(s):

J. Ding ◽

J.‐S. Jenq ◽

G.‐H. Kim ◽

H. L. Maynard ◽

J. S. Hamers ◽

...

Keyword(s):

Energy Flux ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Etching Rate ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Atomic Fluorine ◽

Resonance Plasma

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Characterization of damage in electron cyclotron resonance plasma etched compound semiconductors

Applied Surface Science ◽

10.1016/s0169-4332(97)80149-3 ◽

1997 ◽

Vol 117-118 ◽

pp. 597-604 ◽

Author(s):

S.J. Pearton

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Compound Semiconductors ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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