Reactive Ion Etching of NiFe Thin Films from First-Principles Study: A Case Study

2005 ◽  
Vol 44 (2) ◽  
pp. 893-894 ◽  
Author(s):  
Susumu Watanabe ◽  
Wilson A. Diño ◽  
Hiroshi Nakanishi ◽  
Hideaki Kasai ◽  
Hiroyuki Akinaga
Keyword(s):  
Thin Films ◽  
First Principles ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
First Principles Study

scholarly journals First principles characterisation of bio–nano interface

2021 ◽  
Author(s):  
Ian Rouse ◽  
David Power ◽  
Erik G. Brandt ◽  
Matthew Schneemilch ◽  
Konstantinos Kotsis ◽  
...  
Keyword(s):  
Titanium Dioxide ◽  
First Principles ◽  
Computational Approach ◽  
Titania Nanoparticles ◽  
Coarse Grained ◽  
First Principles Study

We present a multiscale computational approach for the first-principles study of bio-nano interactions. Using titanium dioxide as a case study, we evaluate the affinity of titania nanoparticles to water and biomolecules through atomistic and coarse-grained techniques.

scholarly journals Tailoring the anomalous Hall effect of SrRuO3 thin films by strain: A first principles study

2021 ◽  
Vol 129 (9) ◽  
pp. 093904
Author(s):  
Kartik Samanta ◽  
Marjana Ležaić ◽  
Stefan Blügel ◽  
Yuriy Mokrousov
Keyword(s):  
Thin Films ◽  
Hall Effect ◽  
First Principles ◽  
Anomalous Hall Effect ◽  
First Principles Study

Reactive Ion Etching of Al-1%Cu alloy thin films

2009 ◽  
Author(s):  
Jun Gou ◽  
Zhi-ming Wu ◽  
Hui-ling Tai ◽  
Kai Yuan
Keyword(s):  
Thin Films ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Cu Alloy

Reactive Ion Etching Damage to Ferroelectric Thin Films Capacitors

1994 ◽  
Vol 361 ◽  
Author(s):  
W. Pan ◽  
C.L. Thio ◽  
S.B. Desu ◽  
Cheewon Chung
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Leakage Current ◽  
Reactive Ion Etching ◽  
Ferroelectric Thin Films ◽  
Electric Properties ◽  
Etching Time ◽  
Ion Etching ◽  
Before And After ◽  
Ferroelectric Capacitors

ABSTRACTReactive ion etching damage to sputtered Pt/PZT/Pt ferroelectric capacitors was studied using Ar and CHCIFCF3 etch gases. Electrical properties, hysteresis, fatigue, and leakage current of PZT capacitors, before and after etching, were compared to examine the etching damage. It is found that the damage effects depend on etching time and are mainly due to the physical bombardment effect. The PZT capacitors etched with CHCIFCF3 plasma showed less damage than those etched in Ar plasma. The electric properties of etched Pt/PZT/Pt capacitors are recovered by annealing at 400 °C for 30min.

scholarly journals First principles study of reactions in alucone growth: the role of the organic precursor

2020 ◽  
Vol 49 (25) ◽  
pp. 8710-8721
Author(s):  
Arbresha Muriqi ◽  
Michael Nolan
Keyword(s):  
Thin Films ◽  
Molecular Mechanism ◽  
First Principles ◽  
Organic Precursor ◽  
First Principles Study ◽  
Inorganic Thin Films ◽  
Aluminium Alkoxides

First principles investigation of the molecular mechanism of the growth of hybrid organic–inorganic thin films of aluminium alkoxides, known as “alucones”.

Inductive couple plasma reactive ion etching characteristics of TiO2 thin films

2015 ◽  
Vol 587 ◽  
pp. 20-27 ◽  
Author(s):  
Adrian Adalberto Garay ◽  
Su Min Hwang ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Reactive Ion Etching ◽  
Tio2 Thin Films ◽  
Ion Etching ◽  
Couple Plasma ◽  
Inductive Couple Plasma
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