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Origin of the Hole Current in n-type High-k/Metal Gate Stacks Field Effect Transistor in an Inversion State
Japanese Journal of Applied Physics
◽
10.1143/jjap.46.l1058
◽
2007
◽
Vol 46
(No. 44)
◽
pp. L1058-L1060
◽
Cited By ~ 5
Author(s):
Motoyuki Sato
◽
Kikuo Yamabe
◽
Takayuki Aoyama
◽
Yasuo Nara
◽
Yuzuru Ohji
Keyword(s):
Field Effect
◽
Field Effect Transistor
◽
Gate Stacks
◽
Metal Gate
◽
High K
◽
Effect Transistor
◽
Hole Current
◽
Inversion State
Download Full-text
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References
Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning
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◽
10.1063/1.2890056
◽
2008
◽
Vol 92
(9)
◽
pp. 092901
◽
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Author(s):
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◽
P. Sivasubramani
◽
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◽
C. D. Young
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M. A. Quevedo-Lopez
◽
...
Keyword(s):
Threshold Voltage
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Field Effect Transistor
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Dipole Model
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Metal Gate
◽
High K
◽
Effect Transistor
◽
Voltage Tuning
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Technology computer-aided design simulation study for a strained InGaAs channel n-type metal-oxide-semiconductor field-effect transistor with a high-k dielectric oxide layer and a metal gate electrode
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
◽
10.1116/1.3578466
◽
2011
◽
Vol 29
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◽
pp. 032203
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Author(s):
Shu-Tong Chang
◽
Chang-Chun Lee
◽
P.-H. Sun
Keyword(s):
Computer Aided Design
◽
Field Effect
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Field Effect Transistor
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
High K
◽
Effect Transistor
◽
High K Dielectric
◽
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Observations in trapping characteristics of positive bias temperature instability on high-k/metal gate n-type metal oxide semiconductor field effect transistor with the complementary multi-pulse technique
Thin Solid Films
◽
10.1016/j.tsf.2007.12.140
◽
2008
◽
Vol 516
(12)
◽
pp. 4222-4225
◽
Cited By ~ 2
Author(s):
J.C. Liao
◽
Y.K. Fang
◽
Y.T. Hou
◽
W.H. Wu
◽
C.L. Hung
◽
...
Keyword(s):
Field Effect
◽
Field Effect Transistor
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Positive Bias
◽
Metal Gate
◽
Pulse Technique
◽
Bias Temperature Instability
◽
High K
◽
Effect Transistor
Download Full-text
A tunneling field-effect transistor using side metal gate/high-k material for low power application
2011 International Semiconductor Device Research Symposium (ISDRS)
◽
10.1109/isdrs.2011.6135286
◽
2011
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Cited By ~ 2
Author(s):
Hyun Woo Kim
◽
Jung Han Lee
◽
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◽
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Low Power
◽
Field Effect
◽
Field Effect Transistor
◽
Metal Gate
◽
High K
◽
Effect Transistor
◽
Power Application
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Inversion mode n-channel GaAs field effect transistor with high-k/metal gate
Applied Physics Letters
◽
10.1063/1.2912027
◽
2008
◽
Vol 92
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◽
pp. 153508
◽
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Author(s):
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◽
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◽
Y. Sun
◽
A. Callegari
◽
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Field Effect
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Field Effect Transistor
◽
Metal Gate
◽
Inversion Mode
◽
High K
◽
Effect Transistor
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Memory and negative-resistance effects in a strained metal-gate high-k n-type field-effect-transistor from 375 K down to 77 K
Semiconductor Science and Technology
◽
10.1088/0268-1242/31/12/124003
◽
2016
◽
Vol 31
(12)
◽
pp. 124003
Author(s):
E A Gutiérrez-D
◽
V H Vega-G
◽
P J García-R
◽
O V Huerta-G
Keyword(s):
Field Effect
◽
Field Effect Transistor
◽
Negative Resistance
◽
Metal Gate
◽
High K
◽
Effect Transistor
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Dipole Model Explaining High-k/Metal Gate Field Effect Transistor Threshold Voltage Tuning
ECS Meeting Abstracts
◽
10.1149/ma2009-01/15/725
◽
2009
◽
Keyword(s):
Threshold Voltage
◽
Field Effect
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Field Effect Transistor
◽
Dipole Model
◽
Metal Gate
◽
High K
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Effect Transistor
◽
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Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
◽
10.1116/1.4974250
◽
2017
◽
Vol 35
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◽
pp. 012202
Author(s):
Shahab Siddiqui
◽
Min Dai
◽
Rainer Loesing
◽
Erdem Kaltalioglu
◽
Rajan Pandey
◽
...
Keyword(s):
High Voltage
◽
Field Effect
◽
Oxygen Plasma
◽
Field Effect Transistor
◽
Atomic Layer
◽
Metal Gate
◽
Input And Output
◽
High K
◽
Effect Transistor
Download Full-text
Investigation of Positive Bias Temperature Instability Characteristics of Fully Depleted Silicon on Insulator Tunneling Field Effect Transistor with High-k Dielectric Gate Stacks
Journal of Nanoscience and Nanotechnology
◽
10.1166/jnn.2019.16992
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2019
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Vol 19
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◽
pp. 6131-6134
Author(s):
Hyeong-Sub Song
◽
So-Yeong Kim
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Sung-Kyu Kwon
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...
Keyword(s):
Field Effect
◽
Field Effect Transistor
◽
Silicon On Insulator
◽
Positive Bias
◽
Gate Stacks
◽
Fully Depleted
◽
Bias Temperature Instability
◽
High K
◽
Effect Transistor
◽
High K Dielectric
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Effect of La$_{2}$O$_{3}$ Capping Layer Thickness on Hot-Carrier Degradation of n-Channel Metal–Oxide–Semiconductor Field-Effect Transistors with High-$k$/Metal Gate Stacks
Japanese Journal of Applied Physics
◽
10.1143/jjap.51.02bc10
◽
2012
◽
Vol 51
(2)
◽
pp. 02BC10
Author(s):
Dongwoo Kim
◽
Seonhaeng Lee
◽
Cheolgyu Kim
◽
Taekyung Oh
◽
Bongkoo Kang
Keyword(s):
Metal Oxide
◽
Layer Thickness
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Gate Stacks
◽
Metal Gate
◽
Hot Carrier
◽
High K
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