Observations in trapping characteristics of positive bias temperature instability on high-k/metal gate n-type metal oxide semiconductor field effect transistor with the complementary multi-pulse technique
2011 ◽
Vol 29
(3)
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pp. 032203
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2011 ◽
Vol 29
(1)
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pp. 01AA05
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2010 ◽
Vol 49
(4)
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pp. 04DA16
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2009 ◽
Vol 48
(4)
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pp. 04C013
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1999 ◽
Vol 38
(Part 2, No. 6A/B)
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pp. L629-L631
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Keyword(s):
2008 ◽
Vol 29
(9)
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pp. 977-980
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