Effect of Plasma Power on Structure of Hydrogenated Nanocrystalline Cubic Silicon Carbide Films Deposited by Very High Frequency Plasma-Enhanced Chemical Vapor Deposition at a Low Substrate Temperature

Shinsuke Miyajima; Makoto Sawamura; Akira Yamada; Makoto Konagai

doi:10.1143/jjap.47.3368

Effect of Plasma Power on Structure of Hydrogenated Nanocrystalline Cubic Silicon Carbide Films Deposited by Very High Frequency Plasma-Enhanced Chemical Vapor Deposition at a Low Substrate Temperature

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.3368 ◽

2008 ◽

Vol 47 (5) ◽

pp. 3368-3371 ◽

Cited By ~ 14

Author(s):

Shinsuke Miyajima ◽

Makoto Sawamura ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Silicon Carbide ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Plasma Power ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Cubic Silicon Carbide ◽

Very High

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Effects of Hydrogen Dilution Ratio on Properties of Hydrogenated Nanocrystalline Cubic Silicon Carbide Films Deposited by Very High-Frequency Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.l693 ◽

2007 ◽

Vol 46 (No. 28) ◽

pp. L693-L695 ◽

Cited By ~ 17

Author(s):

Shinsuke Miyajima ◽

Makoto Sawamura ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Dilution Ratio ◽

Very High Frequency ◽

Hydrogen Dilution ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Cubic Silicon Carbide ◽

Very High

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Gas phase diagnostics during silicon carbide films deposition using very high frequency - plasma enhanced chemical vapor deposition

10.1063/1.4915240 ◽

2015 ◽

Author(s):

N. Mustapha ◽

M. F. Omar ◽

A. K. Ismail ◽

J. Zainal ◽

R. K. Raja Ibrahim

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism

Journal of Materials Science ◽

10.1007/s10853-011-5435-6 ◽

2011 ◽

Vol 46 (15) ◽

pp. 5085-5089 ◽

Cited By ~ 11

Author(s):

Habib Hamidinezhad ◽

Yussof Wahab ◽

Zulkafli Othaman

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Si Nanowires ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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ERRATA: MICROCRYSTALLINE SILICON FILMS PREPARED BY VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AT LOW TEMPERATURE

International Journal of Modern Physics B ◽

10.1142/s0217979205032310 ◽

2005 ◽

Vol 19 (21) ◽

pp. 3413-3413

Author(s):

ZHIMENG WU ◽

QINGSONG LEI ◽

JIANPING XI ◽

ZHAO YING ◽

XINHUA GENG

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Pulsed very high-frequency plasma-enhanced chemical vapor deposition of silicon films for low-temperature (120 °C) thin film transistors

Journal of Physics D Applied Physics ◽

10.1088/1361-6463/ab9919 ◽

2020 ◽

Vol 53 (41) ◽

pp. 415201

Author(s):

Hiroaki Kakiuchi ◽

Hiromasa Ohmi ◽

Kiyoshi Yasutake

Keyword(s):

Thin Film ◽

Low Temperature ◽

Vapor Deposition ◽

High Frequency ◽

Thin Film Transistors ◽

Chemical Vapor ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Using optical emission spectroscopy (OES) to monitor In-line very high-frequency plasma enhanced chemical vapor deposition (VHF-PECVD) technique optoelectrical properties

2019 Compound Semiconductor Week (CSW) ◽

10.1109/iciprm.2019.8819292 ◽

2019 ◽

Author(s):

Jia-Yan Lin ◽

Cheng-Yuan Hung ◽

Wei-Chen Tien ◽

Hung-Wei Wu ◽

Yung-Der Juang ◽

...

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Chemical Vapor ◽

Optical Emission ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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High rate deposition of diamond like carbon films by very high frequency plasma enhanced chemical vapor deposition at 100 MHz

Journal of Applied Physics ◽

10.1063/1.1561997 ◽

2003 ◽

Vol 93 (10) ◽

pp. 6361-6369 ◽

Cited By ~ 14

Author(s):

Sushil Kumar ◽

P. N. Dixit ◽

D. Sarangi ◽

R. Bhattacharyya

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Carbon Films ◽

High Rate ◽

Diamond Like Carbon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Comparison of Microstructure and Crystal Structure of Polycrystalline Silicon Exhibiting Varied Textures Fabricated by Microwave and Very High Frequency Plasma Enhanced Chemical Vapor Deposition and Their Transport Properties

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.5750 ◽

1999 ◽

Vol 38 (Part 1, No. 10) ◽

pp. 5750-5756 ◽

Cited By ~ 17

Author(s):

Toshio Kamiya ◽

Kouichi Nakahata ◽

Kazuyoshi Ro ◽

Charles M. Fortmann ◽

Isamu Shimizu

Keyword(s):

Crystal Structure ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Frequency ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Microstructure characterization of microcrystalline silicon thin films deposited by very high frequency plasma-enhanced chemical vapor deposition by spectroscopic ellipsometry

Thin Solid Films ◽

10.1016/j.tsf.2011.04.166 ◽

2011 ◽

Vol 520 (2) ◽

pp. 861-865 ◽

Cited By ~ 6

Author(s):

He Zhang ◽

Xiaodan Zhang ◽

Changchun Wei ◽

Jian Sun ◽

Xinhua Geng ◽

...

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

Silicon Thin Films ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Fabrication of Polycrystalline Silicon Films from SiF4/H2/SiH4Gas Mixture Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.3294 ◽

2000 ◽

Vol 39 (Part 1, No. 6A) ◽

pp. 3294-3301 ◽

Cited By ~ 14

Author(s):

Kouichi Nakahata ◽

Kazuyoshi Ro ◽

Atsushi Suemasu ◽

Toshio Kamiya ◽

Charles Michael Fortmann ◽

...

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Polycrystalline Silicon Films ◽

Very High

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