Reliability in Short-Channel p-Type Polycrystalline Silicon Thin-Film Transistor under High Gate and Drain Bias Stress

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.03ca04 ◽

2010 ◽

Vol 49 (3) ◽

pp. 03CA04 ◽

Author(s):

Sung-Hwan Choi ◽

Sun-Jae Kim ◽

Yeon-Gon Mo ◽

Hye-Dong Kim ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Silicon Thin Film ◽

Short Channel ◽

Bias Stress ◽

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Positive Shift of Threshold Voltage in Short-Channel (L= 1.5 µm) p-Type Polycrystalline Silicon Thin-Film Transistor under Off-State Bias Stress

Japanese Journal of Applied Physics ◽

10.1143/jjap.48.03b011 ◽

2009 ◽

Vol 48 (3) ◽

pp. 03B011 ◽

Author(s):

Sung-Hwan Choi ◽

Hee-Sun Shin ◽

Yeon-Gon Mo ◽

Hye-Dong Kim ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Threshold Voltage ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Silicon Thin Film ◽

Short Channel ◽

Positive Shift ◽

Bias Stress ◽

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Effect of Dynamic Bias Stress in Short-Channel ($L=1.5$ $\mu$m) p-Type Polycrystalline Silicon Thin-Film Transistors

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.021401 ◽

2012 ◽

Vol 51 ◽

pp. 021401

Author(s):

Sung-Hwan Choi ◽

Yeon-Gon Mo ◽

Hye-Dong Kim ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Silicon Thin Film ◽

Short Channel ◽

Bias Stress ◽

P Type ◽

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Effect of Dynamic Bias Stress in Short-Channel (L=1.5 µm) p-Type Polycrystalline Silicon Thin-Film Transistors

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.021401 ◽

2012 ◽

Vol 51 (2R) ◽

pp. 021401

Author(s):

Sung-Hwan Choi ◽

Yeon-Gon Mo ◽

Hye-Dong Kim ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Silicon Thin Film ◽

Short Channel ◽

Bias Stress ◽

P Type ◽

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Elimination of the Hump Current of P-Channel Polycrystalline Silicon Thin-Film Transistor After Positive Bias Stress

2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) ◽

10.1109/ipfa.2018.8452570 ◽

2018 ◽

Author(s):

Yiran Wei ◽

Dongli Zhang ◽

Mingxiang Wang

Keyword(s):

Thin Film ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Positive Bias ◽

Silicon Thin Film ◽

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Bias-Temperature- and Light-Induced Instability in Short-Channel (L= 1.5 µm) p-Type Polycrystalline Silicon Thin-Film Transistors on Glass Substrates

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.071401 ◽

2011 ◽

Vol 50 (7R) ◽

pp. 071401

Author(s):

Sung-Hwan Choi ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Silicon Thin Film ◽

Short Channel ◽

Glass Substrates ◽

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Hot-Carrier Effects in Short Channel (L= 1.5 µm) p-Type Polycrystalline Silicon Thin-Film Transistors

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.024103 ◽

2012 ◽

Vol 51 (2R) ◽

pp. 024103

Author(s):

Sung-Hwan Choi ◽

Yeon-Gon Mo ◽

Hye-Dong Kim ◽

Min-Koo Han

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Silicon Thin Film ◽

Short Channel ◽

Hot Carrier ◽

Hot Carrier Effects ◽

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Abnormal Output Characteristics of p-Type Low Temperature Polycrystalline Silicon Thin Film Transistor Fabricated on Polyimide Substrate

IEEE Journal of the Electron Devices Society ◽

10.1109/jeds.2015.2493561 ◽

2016 ◽

Vol 4 (1) ◽

pp. 7-10 ◽

Author(s):

Seok-Woo Lee ◽

Chang Bum Park ◽

Pyo Jin Jeon ◽

Sung-Wook Min ◽

June Yeong Lim ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Silicon Thin Film ◽

Polyimide Substrate ◽

Output Characteristics ◽

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Non-classical polycrystalline silicon thin-film transistor with embedded block-oxide for suppressing the short channel effect

Semiconductor Science and Technology ◽

10.1088/0268-1242/23/7/075007 ◽

2008 ◽

Vol 23 (7) ◽

pp. 075007 ◽

Author(s):

Jyi-Tsong Lin ◽

Kuo-Dong Huang ◽

Shu-Fen Hu

Keyword(s):

Thin Film ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Silicon Thin Film ◽

Short Channel ◽

Short Channel Effect ◽

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Anomalous degradation behavior of p-type polycrystalline silicon thin film transistors under negative gate bias stress

Proceedings of the 20th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) ◽

10.1109/ipfa.2013.6599263 ◽

2013 ◽

Author(s):

Meng Zhang ◽

Wei Zhou ◽

Rongsheng Chen ◽

Man Wong ◽

Hoi-Sing Kwok

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Gate Bias ◽

Degradation Behavior ◽

Silicon Thin Film ◽

Bias Stress ◽

P Type ◽

Gate Bias Stress

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Investigations on the Gate-Induced Drain Leakage Current of Polycrystalline-Silicon Thin-Film Transistor and Its Suppression With Drain Bias Sweep

IEEE Transactions on Electron Devices ◽

10.1109/ted.2016.2533162 ◽

2016 ◽

Vol 63 (4) ◽

pp. 1572-1577 ◽

Author(s):

Dongli Zhang ◽

Mingxiang Wang ◽

Huaisheng Wang ◽

Qi Shan

Keyword(s):

Thin Film ◽

Leakage Current ◽

Polycrystalline Silicon ◽

Thin Film Transistor ◽

Silicon Thin Film ◽

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