End-Point Detection of Ta/TaN Chemical Mechanical Planarization via Forces Analysis

2010 ◽  
Vol 49 (5) ◽  
pp. 05FC01 ◽  
Author(s):  
Yasa Sampurno ◽  
Xun Gu ◽  
Takenao Nemoto ◽  
Yun Zhuang ◽  
Akinobu Teramoto ◽  
...  
2017 ◽  
Vol 739 ◽  
pp. 75-80 ◽  
Author(s):  
Hong Kai Li ◽  
Tong Qing Wang ◽  
De Wen Zhao ◽  
Jian Bin Luo ◽  
Xin Chun Lu

Accurate determination of a chemical mechanical planarization (CMP) process reaching the end point is an important problem in the CMP process. In present work, the variation of the motor power signal of the polishing platen in the CMP process has been investigated, and the moving average method with 121-points moving window was used to smooth the original signal curve. Experiment results showed that the processed signal could facilitate the extraction of end-point feature for the in-situ end-point detection (EPD) system and it was relatively steady before and after the layer transition stage, which made it more reliable to detect the end point in situ. Comparing with other EPD methods, the system was less complicated, and it was easier to code for algorithm development. Finally, further analysis was performed and series of experiments provided a planarized via-revealed surface with low via dishing.


Author(s):  
Jingang Yi ◽  
C. Shan Xu

In this paper we discuss an end-point detection (EPD) method for the dielectric linear chemical-mechanical planarization (CMP) processes. The proposed EPD algorithms utilize the interferometry optical signals to determine the film post-thicknesses. A set of collected broadband spectral signals is formed as an spectral image. An image-matching technique is then used to match the pre-processed signal image to the reference image template obtained at the target film thickness. Several matching criteria are discussed and compared. We find that the image correlation coefficient is a good indicator to determine the process end-point. We also consider the impact of the material removal rate variations on the interferometry spectral signals. An analytical calculation is carried out to find an extraction and compression searching range of the spectral image to compensate for the removal rate uncertainties in real processes. The correctness and effectiveness of the proposed algorithms have been demonstrated through applications to an inter-metal dielectric (IMD) device CMP process. Compared with other optical EPD methods, the proposed image-matching method are robust to the CMP process variations.


Talanta ◽  
2021 ◽  
Vol 224 ◽  
pp. 121735
Author(s):  
Claudio Avila ◽  
Christos Mantzaridis ◽  
Joan Ferré ◽  
Rodrigo Rocha de Oliveira ◽  
Uula Kantojärvi ◽  
...  

1979 ◽  
Vol 25 (6) ◽  
pp. 973-975 ◽  
Author(s):  
T Chard ◽  
A Sykes

Abstract We describe an immunoassay for human choriomammo-tropin by use of the fluorescein-labeled hormone (of human origin). The technique is generally similar to the radioimmunoassay for this material, but has the advantage of stability of tracer and avoidance of radiation hazard. However, the procedure requires approximately 50-fold more tracer than does the radioimmunoassay, and this would be a disadvantage with materials for which supplies of purified antigen are scarce. Furthermore, both within-assay variation (3.9%) and between-assay variation (7.8--7.9%) were less satisfactory than that of radioimmunoassay (1.5% and 2.2--3%, respectively). This is almost certainly the result of imprecision of end-point detection and could probably be corrected by further attention to equipment design.


2005 ◽  
Vol 38 (1) ◽  
pp. 115-120
Author(s):  
Hilario López García ◽  
Iván Machón González

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