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Intrinsic Effects of the Crystal Orientation Difference between (100) and (110) Silicon Substrates on Characteristics of High-k/Metal Gate Metal–Oxide–Semiconductor Field-Effect Transistors
Japanese Journal of Applied Physics
◽
10.1143/jjap.50.061503
◽
2011
◽
Vol 50
(6)
◽
pp. 061503
◽
Cited By ~ 3
Author(s):
Ryosuke Iijima
◽
Lisa F. Edge
◽
John Bruley
◽
Vamsi Paruchuri
◽
Mariko Takayanagi
Keyword(s):
Metal Oxide
◽
Crystal Orientation
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Silicon Substrates
◽
Metal Gate
◽
High K
◽
Orientation Difference
Download Full-text
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Cited By
References
Intrinsic Effects of the Crystal Orientation Difference between (100) and (110) Silicon Substrates on Characteristics of High-k/Metal Gate Metal–Oxide–Semiconductor Field-Effect Transistors
Japanese Journal of Applied Physics
◽
10.7567/jjap.50.061503
◽
2011
◽
Vol 50
(6R)
◽
pp. 061503
◽
Cited By ~ 1
Author(s):
Ryosuke Iijima
◽
Lisa F. Edge
◽
John Bruley
◽
Vamsi Paruchuri
◽
Mariko Takayanagi
Keyword(s):
Metal Oxide
◽
Crystal Orientation
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Silicon Substrates
◽
Metal Gate
◽
High K
◽
Orientation Difference
Download Full-text
Effect of La$_{2}$O$_{3}$ Capping Layer Thickness on Hot-Carrier Degradation of n-Channel Metal–Oxide–Semiconductor Field-Effect Transistors with High-$k$/Metal Gate Stacks
Japanese Journal of Applied Physics
◽
10.1143/jjap.51.02bc10
◽
2012
◽
Vol 51
(2)
◽
pp. 02BC10
Author(s):
Dongwoo Kim
◽
Seonhaeng Lee
◽
Cheolgyu Kim
◽
Taekyung Oh
◽
Bongkoo Kang
Keyword(s):
Metal Oxide
◽
Layer Thickness
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Gate Stacks
◽
Metal Gate
◽
Hot Carrier
◽
High K
Download Full-text
Subnanometer-equivalent-oxide-thickness germanium p-metal-oxide-semiconductor field effect transistors fabricated using molecular-beam-deposited high-k/metal gate stack
Applied Physics Letters
◽
10.1063/1.2189456
◽
2006
◽
Vol 88
(13)
◽
pp. 132107
◽
Cited By ~ 67
Author(s):
A. Ritenour
◽
A. Khakifirooz
◽
D. A. Antoniadis
◽
R. Z. Lei
◽
W. Tsai
◽
...
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Molecular Beam
◽
Field Effect Transistors
◽
Oxide Thickness
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Equivalent Oxide Thickness
◽
Metal Gate
◽
High K
Download Full-text
Inversion-type surface channel In0.53]Ga{in0.47As metal-oxide-semiconductor field-effect transistors with metal-gate/high-k dielectric stack and CMOS-compatible PdGe contacts
2009 International Symposium on VLSI Technology, Systems, and Applications
◽
10.1109/vtsa.2009.5159330
◽
2009
◽
Author(s):
Hock-Chun Chin
◽
Xinke Liu
◽
Leng-Seow Tan
◽
Yee-Chia Yeo
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
High K
◽
Cmos Compatible
◽
High K Dielectric
Download Full-text
Effect of La2O3Capping Layer Thickness on Hot-Carrier Degradation of n-Channel Metal–Oxide–Semiconductor Field-Effect Transistors with High-k/Metal Gate Stacks
Japanese Journal of Applied Physics
◽
10.7567/jjap.51.02bc10
◽
2012
◽
Vol 51
(2S)
◽
pp. 02BC10
◽
Cited By ~ 2
Author(s):
Dongwoo Kim
◽
Seonhaeng Lee
◽
Cheolgyu Kim
◽
Taekyung Oh
◽
Bongkoo Kang
Keyword(s):
Metal Oxide
◽
Layer Thickness
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Gate Stacks
◽
Metal Gate
◽
Hot Carrier
◽
High K
Download Full-text
Further work function and interface quality improvement on Al2O3 capped high-k/metal gate p-type metal-oxide-semiconductor field-effect-transistors by incorporation of fluorine
Thin Solid Films
◽
10.1016/j.tsf.2012.02.087
◽
2012
◽
Vol 520
(13)
◽
pp. 4482-4485
◽
Cited By ~ 1
Author(s):
Y.W. Chen
◽
C.M. Lai
◽
L.W. Cheng
◽
C.H. Hsu
◽
C.W. Hsu
Keyword(s):
Quality Improvement
◽
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
Interface Quality
◽
High K
◽
P Type
Download Full-text
Physical understanding of different drain-induced-barrier-lowering variations in high-k/metal gate n-channel metal-oxide-semiconductor-field-effect-transistors induced by charge trapping under normal and reverse channel hot carrier stresses
Applied Physics Letters
◽
10.1063/1.4826918
◽
2013
◽
Vol 103
(18)
◽
pp. 183502
◽
Cited By ~ 4
Author(s):
Weichun Luo
◽
Hong Yang
◽
Wenwu Wang
◽
Lichuan Zhao
◽
Hao Xu
◽
...
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Charge Trapping
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
Hot Carrier
◽
Physical Understanding
◽
High K
Download Full-text
Effects of gate edge profile on off-state leakage suppresion in metal gate/high-k dielectric n-type metal-oxide-semiconductor field effect transistors
Applied Physics Letters
◽
10.1063/1.2734381
◽
2007
◽
Vol 90
(18)
◽
pp. 183501
◽
Cited By ~ 3
Author(s):
Chang Yong Kang
◽
Rino Choi
◽
S. C. Song
◽
B. H. Lee
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
High K
◽
Edge Profile
◽
High K Dielectric
◽
Gate Edge
Download Full-text
Hot carrier effect on gate-induced drain leakage current in high-k/metal gate n-channel metal-oxide-semiconductor field-effect transistors
Applied Physics Letters
◽
10.1063/1.3608241
◽
2011
◽
Vol 99
(1)
◽
pp. 012106
◽
Cited By ~ 27
Author(s):
Chih-Hao Dai
◽
Ting-Chang Chang
◽
Ann-Kuo Chu
◽
Yuan-Jui Kuo
◽
Szu-Han Ho
◽
...
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
Hot Carrier
◽
Carrier Effect
◽
High K
◽
Hot Carrier Effect
Download Full-text
Impact of static and dynamic stress on threshold voltage instability in high-k/metal gate n-channel metal-oxide-semiconductor field-effect transistors
Applied Physics Letters
◽
10.1063/1.3560463
◽
2011
◽
Vol 98
(9)
◽
pp. 092112
◽
Cited By ~ 21
Author(s):
Chih-Hao Dai
◽
Ting-Chang Chang
◽
Ann-Kuo Chu
◽
Yuan-Jui Kuo
◽
Wen-Hung Lo
◽
...
Keyword(s):
Metal Oxide
◽
Threshold Voltage
◽
Field Effect
◽
Dynamic Stress
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Metal Gate
◽
Voltage Instability
◽
High K
Download Full-text
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