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Real Time Spectroscopic Ellipsometry Study on Growth Processes of ZrO[sub 2] Thin Films in Metallorganic Chemical Vapor Deposition
Journal of The Electrochemical Society
◽
10.1149/1.1388885
◽
2001
◽
Vol 148
(9)
◽
pp. C632
◽
Cited By ~ 6
Author(s):
Takeo Kubota
◽
Nobuyoshi Hara
◽
Katsuhisa Sugimoto
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Real Time
◽
Spectroscopic Ellipsometry
◽
Vapor Deposition
◽
Chemical Vapor
◽
Growth Processes
Download Full-text
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Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry
Journal of Physics D Applied Physics
◽
10.1088/1361-6463/ac1ec1
◽
2021
◽
Vol 54
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◽
pp. 445303
Author(s):
W Ravisy
◽
M Richard-Plouet
◽
B Dey
◽
S Bulou
◽
P Choquet
◽
...
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Real Time
◽
Spectroscopic Ellipsometry
◽
Vapor Deposition
◽
Critical Thickness
◽
Chemical Vapor
◽
Tio2 Thin Films
◽
Photocatalytic Tio2
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In situ studies of the amorphous to microcrystalline transition of hot-wire chemical vapor deposition Si:H films using real-time spectroscopic ellipsometry
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
◽
10.1116/1.1564037
◽
2003
◽
Vol 21
(4)
◽
pp. 1545-1549
◽
Cited By ~ 5
Author(s):
D. H. Levi
◽
B. P. Nelson
◽
J. D. Perkins
◽
H. R. Moutinho
Keyword(s):
Chemical Vapor Deposition
◽
Real Time
◽
Spectroscopic Ellipsometry
◽
Vapor Deposition
◽
Chemical Vapor
◽
Hot Wire
◽
In Situ Studies
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In situreal-time spectroscopic ellipsometry study of HfO2 thin films grown by using the pulsed-source metal-organic chemical-vapor deposition
Journal of Applied Physics
◽
10.1063/1.1827912
◽
2005
◽
Vol 97
(2)
◽
pp. 023527
◽
Cited By ~ 7
Author(s):
Yangdong Zheng
◽
Hiroshi Mizuta
◽
Yoshishige Tsuchiya
◽
Masato Endo
◽
Daisuke Sato
◽
...
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Spectroscopic Ellipsometry
◽
Vapor Deposition
◽
Chemical Vapor
◽
Organic Chemical
◽
Metal Organic
◽
Organic Chemical Vapor Deposition
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Real time measurements of charged gas phase nuclei during the deposition of silicon thin films by hot wire chemical vapor deposition
Current Applied Physics
◽
10.1016/j.cap.2012.12.016
◽
2013
◽
Vol 13
◽
pp. S45-S49
◽
Cited By ~ 2
Author(s):
Ju-Seop Hong
◽
Chan-Soo Kim
◽
Seung-Wan Yoo
◽
Seong-Han Park
◽
Sung-Soo Lee
◽
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Keyword(s):
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Chemical Vapor Deposition
◽
Real Time
◽
Gas Phase
◽
Vapor Deposition
◽
Chemical Vapor
◽
Hot Wire
◽
Silicon Thin Films
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Ex situ spectroscopic ellipsometry investigation of the layered structure of polycrystalline diamond thin films grown by electron cyclotron resonance-assisted chemical vapor deposition
Journal of Applied Physics
◽
10.1063/1.1384487
◽
2001
◽
Vol 90
(3)
◽
pp. 1280-1285
◽
Cited By ~ 11
Author(s):
S. Gupta
◽
B. R. Weiner
◽
G. Morell
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Spectroscopic Ellipsometry
◽
Layered Structure
◽
Vapor Deposition
◽
Cyclotron Resonance
◽
Electron Cyclotron Resonance
◽
Chemical Vapor
◽
Polycrystalline Diamond
◽
Ex Situ
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Spectroscopic ellipsometry studies on the optical constants of Bi4Ti3O12:xNa thin films grown by metal-organic chemical vapor deposition
Thin Solid Films
◽
10.1016/j.tsf.2010.12.242
◽
2011
◽
Vol 519
(11)
◽
pp. 3782-3788
◽
Cited By ~ 5
Author(s):
S. Bin Anooz
◽
J. Schwarzkopf
◽
R. Dirsyte
◽
E. Agócs
◽
P. Petrik
◽
...
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Spectroscopic Ellipsometry
◽
Vapor Deposition
◽
Optical Constants
◽
Chemical Vapor
◽
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◽
Metal Organic
◽
Organic Chemical Vapor Deposition
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Real time spectroscopic ellipsometry characterization of the nucleation of diamond by filament‐assisted chemical vapor deposition
Journal of Applied Physics
◽
10.1063/1.350544
◽
1992
◽
Vol 71
(10)
◽
pp. 5287-5289
◽
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Author(s):
R. W. Collins
◽
Yue Cong
◽
H. V. Nguyen
◽
Ilsin An
◽
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◽
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In Situ Growth Monitoring During Metalorganic Chemical Vapor Deposition of YBa 2Cu 3Ox Thin Films by Spectroscopic Ellipsometry
Japanese Journal of Applied Physics
◽
10.1143/jjap.38.l632
◽
1999
◽
Vol 38
(Part 2, No. 6A/B)
◽
pp. L632-L635
◽
Cited By ~ 2
Author(s):
Shuu'ichirou Yamamoto
◽
Satoshi Sugai
◽
Yasunari Matsukawa
◽
Akio Sengoku
◽
Hiroshi Tobisaka
◽
...
Keyword(s):
Thin Films
◽
Chemical Vapor Deposition
◽
Spectroscopic Ellipsometry
◽
Vapor Deposition
◽
Metalorganic Chemical Vapor Deposition
◽
Chemical Vapor
◽
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◽
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◽
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Anatomy of μc-Si thin films by plasma enhanced chemical vapor deposition: An investigation by spectroscopic ellipsometry
Journal of Applied Physics
◽
10.1063/1.1287129
◽
2000
◽
Vol 88
(5)
◽
pp. 2408-2414
◽
Cited By ~ 38
Author(s):
M. Losurdo
◽
R. Rizzoli
◽
C. Summonte
◽
G. Cicala
◽
P. Capezzuto
◽
...
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Thin Films
◽
Chemical Vapor Deposition
◽
Spectroscopic Ellipsometry
◽
Vapor Deposition
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Spectroscopic ellipsometry studies on hydrogenated amorphous silicon thin films deposited using DC saddle field plasma enhanced chemical vapor deposition system
Thin Solid Films
◽
10.1016/j.tsf.2010.12.074
◽
2011
◽
Vol 519
(9)
◽
pp. 2863-2866
◽
Cited By ~ 9
Author(s):
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◽
Barzin Bahardoust
◽
Keith Leong
◽
Adel B. Gougam
◽
Nazir P. Kherani
◽
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Thin Films
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Chemical Vapor Deposition
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Spectroscopic Ellipsometry
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