scholarly journals Remote Plasma Enhanced Chemical Vapor Deposition of Silicon Films at Low Temperatures from Si2 H 6 ‐  H 2 ‐ SiF4

1996 ◽  
Vol 143 (8) ◽  
pp. 2640-2645 ◽  
Author(s):  
Dong‐Hwan Kim ◽  
Young‐Bae Park ◽  
Il‐Jeong Lee ◽  
Shi‐Woo Rhee
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Low Temperatures ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Remote Plasma

Experimental studies of growth kinetics of silicon by remote plasma-enhanced chemical vapor deposition at low temperatures

1990 ◽  
Author(s):  
Brian G. Anthony ◽  
Ting-Chen Hsu ◽  
Louis H. Breaux ◽  
Rong Z. Qian ◽  
Sanjay K. Banerjee ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Growth Kinetics ◽  
Vapor Deposition ◽  
Low Temperatures ◽  
Experimental Studies ◽  
Chemical Vapor ◽  
Remote Plasma ◽  
Kinetics Of
Sign in / Sign up

Export Citation Format

Share Document