Effect of fluorine chemistry in the remote plasma enhanced chemical vapor deposition of silicon films from Si2H6-SiF4-H2
1995 ◽
Vol 12
(5)
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pp. 572-575
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Keyword(s):
1996 ◽
Vol 143
(8)
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pp. 2640-2645
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Keyword(s):
2006 ◽
Vol 514-516
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pp. 475-482
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2007 ◽
Vol 38
(1-2)
◽
pp. 148-151
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