scholarly journals Effects of chlorine addition on the silicon dioxide properties deposited with remote plasma enhanced chemical vapor deposition at low temperatures

1995 ◽  
Vol 66 (25) ◽  
pp. 3477-3479 ◽  
Author(s):  
Young‐Bae Park ◽  
Shi‐Woo Rhee
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Low Temperatures ◽  
Chemical Vapor ◽  
Remote Plasma

Experimental studies of growth kinetics of silicon by remote plasma-enhanced chemical vapor deposition at low temperatures

1990 ◽  
Author(s):  
Brian G. Anthony ◽  
Ting-Chen Hsu ◽  
Louis H. Breaux ◽  
Rong Z. Qian ◽  
Sanjay K. Banerjee ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Growth Kinetics ◽  
Vapor Deposition ◽  
Low Temperatures ◽  
Experimental Studies ◽  
Chemical Vapor ◽  
Remote Plasma ◽  
Kinetics Of
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