X‐Ray Photoelectron Spectroscopy Analyses of Oxide‐Masked Polycrystalline SiGe Features Etched in a High‐Density Plasma Source
1997 ◽
Vol 144
(7)
◽
pp. 2455-2461
◽
2000 ◽
Vol 18
(5)
◽
pp. 2224
◽
Keyword(s):
2014 ◽
Vol 85
(6)
◽
pp. 063503
◽
2007 ◽
Vol 353-358
◽
pp. 1829-1832
1994 ◽
Vol 3
(10)
◽
pp. 746-757
◽
2001 ◽
Vol 34
(18)
◽
pp. 2769-2774
◽
1995 ◽
Vol 54
(1-2)
◽
pp. 97-103
◽
2005 ◽
Vol 119
(3)
◽
pp. 268-273
◽