Atomic Layer Deposition of Al2O3/NiO/Al2O3 Laminate Structures for Nonvolatile Memory Device Applications
2011 ◽
Vol 14
(7)
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pp. J41
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2019 ◽
Vol 7
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pp. 453-461
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2009 ◽
Vol 48
(9)
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pp. 09KA20
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2008 ◽
Vol 11
(9)
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pp. K89
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Keyword(s):
Keyword(s):
2009 ◽
Vol 86
(7-9)
◽
pp. 1692-1695
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Keyword(s):