In-situ FTIR Study of Atomic Layer Deposition (ALD) of Copper Metal Films

2019 ◽  
Vol 11 (7) ◽  
pp. 91-101 ◽  
Author(s):  
Min Dai ◽  
Jinhee Kwon ◽  
E. Langereis ◽  
Leszek S. Wielunski ◽  
Yves Chabal ◽  
...  
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