Crystallographic Silicon-Etching for Ultra-High Aspect-Ratio FinFET
2019 ◽
Vol 13
(1)
◽
pp. 313-320
◽
Vladimir Jovanovic
◽
Tomislav Suligoj
◽
Lis Nanver
2002 ◽
Vol 12
(5)
◽
pp. 574-581
◽
Jerwei Hsieh
◽
Weileun Fang
Jiang Hu
◽
Shun Zhou
◽
Shuai Hu
◽
Yufeng Zhu
◽
Weiguo Liu
K. J. Owen
◽
B. VanDerElzen
◽
R. L. Peterson
◽
K. Najafi
2020 ◽
Vol 217
(4)
◽
pp. 2070017
Ivan Morozov
◽
Alexander Gudovskikh
◽
Alexander Uvarov
◽
Artem Baranov
◽
Vladimir Sivakov
◽
...
Seong-Hyok Kim
◽
Sang-Hun Lee
◽
Hyung-Taek Lim
◽
Yong-Kweon Kim
◽
Seung-Ki Lee
2019 ◽
Vol 217
(4)
◽
pp. 1900535
◽
Ivan Morozov
◽
Alexander Gudovskikh
◽
Alexander Uvarov
◽
Artem Baranov
◽
Vladimir Sivakov
◽
...
Yemin Tang
◽
Amin Sandoughsaz
◽
Khalil Najafi
2019 ◽
Vol 92
◽
pp. 80-85
◽
Patrick S. Finnegan
◽
Andrew E. Hollowell
◽
Christian L. Arrington
◽
Amber L. Dagel