Friction and Wear-Mode Comparison in Copper Electrochemical Mechanical Polishing

2008 ◽  
Vol 155 (7) ◽  
pp. H520 ◽  
Author(s):  
Dedy Ng ◽  
Tapajyoti Sen ◽  
Feng Gao ◽  
Hong Liang
Keyword(s):  
Friction And Wear ◽  
Mechanical Polishing ◽  
Electrochemical Mechanical Polishing ◽  
Wear Mode

Basic experimental investigation of pulsed electrochemical mechanical polishing process

2009 ◽  
Vol 25 (7) ◽  
pp. 535-540 ◽  
Author(s):  
J. J. Yi ◽  
C. M. Chen ◽  
X. Q. Tian ◽  
B. Y. Ji
Keyword(s):  
Experimental Investigation ◽  
Mechanical Polishing ◽  
Polishing Process ◽  
Electrochemical Mechanical Polishing

Experimental Research of Electrochemical Mechanical Polishing (ECMP) for Micro Tool Electrode

2011 ◽  
Vol 314-316 ◽  
pp. 1846-1850 ◽  
Author(s):  
Shuai Guo ◽  
Z.N Guo ◽  
Hong Ping Luo ◽  
Wen Cai Gu
Keyword(s):  
Experimental Research ◽  
Process Parameters ◽  
Mechanical Polishing ◽  
Working Fluid ◽  
Tool Electrode ◽  
Electrical Parameters ◽  
Electrochemical Mechanical Polishing ◽  
Major Process ◽  
Micro Tool ◽  
Quantitative Analyses

The mechanism of the elctrochemical mechanical polishing (ECMP) technology for micro tool electrode was investigated. In this paper, suitable major process parameters on the surface quality were evaluated, the major parameters contains electrical parameters, machining gap, the working fluid and other factors. In quantitative analyses, the process of the ECMP technology were conducted. The roughness of the workpiece was reduced from a relatively high value to a mirror effect.

Electrochemical mechanical polishing of thin film solar cell flexible stainless steel substrate

2016 ◽  
Vol 24 (2) ◽  
pp. 343-349 ◽  
Author(s):  
张克华 ZHANG Ke-hua ◽  
石 栋 SHI Dong ◽  
刘润之 LIU Run-zhi ◽  
肖志兰 XIAO Zhi-lan ◽  
程光明 CHENG Guang-ming
Keyword(s):  
Thin Film ◽  
Stainless Steel ◽  
Solar Cell ◽  
Thin Film Solar Cell ◽  
Stainless Steel Substrate ◽  
Steel Substrate ◽  
Mechanical Polishing ◽  
Electrochemical Mechanical Polishing

Highly efficient planarization of sliced 4H–SiC (0001) wafer by slurryless electrochemical mechanical polishing

2019 ◽  
Vol 144 ◽  
pp. 103431 ◽  
Author(s):  
Xu Yang ◽  
Xiaozhe Yang ◽  
Kentaro Kawai ◽  
Kenta Arima ◽  
Kazuya Yamamura
Keyword(s):  
Mechanical Polishing ◽  
Highly Efficient ◽  
Electrochemical Mechanical Polishing

Influences of Various Zr Target Current on Tribological Behavior of a-C:H:Zr-x Coatings

2015 ◽  
Vol 642 ◽  
pp. 84-88
Author(s):  
Wen Hsien Kao
Keyword(s):  
Tribological Properties ◽  
Friction And Wear ◽  
Point Contact ◽  
Deposition Process ◽  
Process Conditions ◽  
Wear Depth ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Aisi 52100 ◽  
Wear Mode

A series of a-C:H:Zr-x coatings (the x in the term a-C:H:Zr-x is the Zr target current varied in the deposition process) have been deposited on AISI M2 steel used unbalanced magnetron sputtering system (UBMS). During deposition process, different a-C:H:Zr-x topcoats were deposited by varying the Zr target current from 0.0 A to 0.5A while maintaining the remaining process conditions at the constant settings. The microstructure, adhesion and tribological properties of the a-C:H:Zr-x coatings were found to vary with the Zr content. The tribological properties of the coatings had been tested against AISI 52100 or Si3N4 counterbody under ball-on-disk point contact wear mode using an oscillating friction and wear tester. Of the various coatings, the a-C:H:Zr-0.4 coating provided the best tribological properties, including the lowest wear depth, the friction coefficient and the longest lifetime. Compare to the coatings sliding against both counterbodies, all of coatings possessed the high wear depth as sliding against Si3N4, but it displayed longer wear lifetime than sliding against AISI 52100.

Investigation of anodic oxidation mechanism of 4H-SiC (0001) for electrochemical mechanical polishing

2018 ◽  
Vol 271 ◽  
pp. 666-676 ◽  
Author(s):  
Xu Yang ◽  
Rongyan Sun ◽  
Yuji Ohkubo ◽  
Kentaro Kawai ◽  
Kenta Arima ◽  
...  
Keyword(s):  
Anodic Oxidation ◽  
Oxidation Mechanism ◽  
Mechanical Polishing ◽  
Electrochemical Mechanical Polishing

scholarly journals Study on friction and wear utilizing acoustic emission. Wear mode and AE spectrum of copper.

1990 ◽  
Vol 56 (8) ◽  
pp. 1474-1479 ◽  
Author(s):  
Masaki WADA ◽  
Makio MIZUNO ◽  
Tadasi SASADA
Keyword(s):  
Acoustic Emission ◽  
Friction And Wear ◽  
Wear Mode

Obtaining Atomically Smooth 4H–SiC (0001) Surface by Controlling Balance Between Anodizing and Polishing in Electrochemical Mechanical Polishing

2019 ◽  
Vol 2 (3) ◽  
pp. 140-147 ◽  
Author(s):  
Xu Yang ◽  
Xiaozhe Yang ◽  
Rongyan Sun ◽  
Kentaro Kawai ◽  
Kenta Arima ◽  
...  
Keyword(s):  
Mechanical Polishing ◽  
Electrochemical Mechanical Polishing
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